UV–visible studies of nickel oxide thin film grown by thermal oxidation of nickel

Mohanty, P.; Rath, Chandana; Mallick, P.; Biswal, R.; Mishra, N. C.

doi:10.1016/j.physb.2010.03.064

Cited by 46 publications

(18 citation statements)

References 23 publications

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“…It is worth noting that NiO is known as a p-type semiconductor due to the Ni +2 vacancies which is the considered defect for its p-type conductivity [11,72]. Seebek effect was processed on all the samples and confirmed their p-type conductivity.…”

Section: Electrical Propertiesmentioning

confidence: 82%

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Barir

Benhaoua²,

Benhamida

et al. 2017

Journal of Nanomaterials

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Undoped nickel oxide (NiO) thin films were deposited on 500 ∘ C heated glass substrates using spray pyrolysis method at (0.015-0.1 M) range of precursor. The latter was obtained by decomposition of nickel nitrate hexahydrate in double distilled water. Effect of precursor concentration on structural, optical, and electrical properties of NiO thin films was investigated. X-ray diffraction (XRD) shows the formation of NiO under cubic structure with single diffraction peak along (111) plane at 2 = 37.24 ∘ . When precursor concentration reaches 0.1 M, an increment in NiO crystallite size over 37.04 nm was obtained indicating the product nano structure. SEM images reveal that beyond 0.04 M as precursor concentration the substrate becomes completely covered with NiO and thin films exhibit formation of nano agglomerations at the top of the sample surface. Ni-O bonds vibrations modes in the product of films were confirmed by FT-IR analysis. Transparency of the films ranged from 57 to 88% and band gap energy of the films decreases from 3.68 to 3.60 eV with increasing precursor concentration. Electrical properties of the elaborated NiO thin films were correlated to the precursor concentration.

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Section: Electrical Propertiesmentioning

confidence: 82%

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Barir

Benhaoua²,

Benhamida

et al. 2017

Journal of Nanomaterials

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“…While binary oxides have a longer history of synthesis and investigation, for example the constituents of NiSnO 3 , NiO [8] and SnO 2 [9], there is fewer well investigated ternary oxides as NiSnO3, with a rich phase diagram and a complex defect chemistry to cover a wide range of technologically relevant properties, such as optical and electrochemical activity [10,11]. In various cases, ternary oxides have proven to provide more flexibility than binary one in terms of the electronic and thermodynamic properties that can be varied efficiently by tuning the proportion of each component [12,13]. With respect to the range of materials for chemical sensing, different aspects need to be investigated including ease of synthesis, active surface area, process compatibility with other components required for the respective detection scheme, stability, selectivity, possible reversibility and cost efficiency only to mention the most prominent ones.…”

Section: Introductionmentioning

confidence: 99%

Structural, surface morphology and optical properties of NiSnO3 thin films prepared using spray technique

et al. 2015

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“…These consider Ni oxidation in oxygen atmosphere at high T (between 900 and 1400 C) 3,4 or at 500 C. 26 There is however, to the best of our knowledge, no report on the oxidation process of Ni thin films at lower T and in air, nor its effects on the physical properties, such as magnetism. These consider Ni oxidation in oxygen atmosphere at high T (between 900 and 1400 C) 3,4 or at 500 C. 26 There is however, to the best of our knowledge, no report on the oxidation process of Ni thin films at lower T and in air, nor its effects on the physical properties, such as magnetism.…”

Section: Introductionmentioning

confidence: 99%

Characterization of Ni thin films following thermal oxidation in air

Valladares

Ionescu

Holmes

et al. 2014

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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The authors study the thermal oxidation of nickel thin films (50 nm) fabricated by conventional thermal evaporation, resulting from annealing in air at 300, 325, 350, 400, and 700 C. The characterization is performed by x-ray diffraction, Raman spectroscopy, superconducting quantum interference device magnetometry, and scanning electron microscopy. These techniques show that the oxidation increases with annealing temperature. The formation of granular films of coexisting Ni and NiO is confirmed after annealing at 400 C. The magnetic measurements indicate coexisting ferromagnetism and antiferromagnetism, corresponding to Ni and NiO contributions. The magnetic hysteresis loops reveal exchange bias in the samples annealed at 235, 350, and 400 C due to the competition between the exchange interactions at the Ni/NiO interfaces.

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UV–visible studies of nickel oxide thin film grown by thermal oxidation of nickel

Cited by 46 publications

References 23 publications

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Structural, surface morphology and optical properties of NiSnO3 thin films prepared using spray technique

Characterization of Ni thin films following thermal oxidation in air

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