UV spectral filtering by surface structured multilayer mirrors

Huang, Qiushi; Paardekooper, D.M.; Zoethout, E.; Медведев, В. В.; Kruijs, R. W. E. van de; Bosgra, J.; Louis, Eric; Bijkerk, Frederik

doi:10.1364/ol.39.001185

Cited by 12 publications

(13 citation statements)

References 22 publications

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“…In this case, the OoB radiation over a broad wavelength range will be diffracted to higher orders by the tapered facets and the XUV light is still reflected by the overall periodic multilayer. This method was demonstrated by Huang et al 162,163 The surface tapered structure can have various forms, e.g., blazed grating shapes or symmetric pyramids, in one (1D) or two dimensions (2D). It can be made with a single material which is reflective for the OoB radiation and transparent for XUV, or consists of the multilayer structure itself (Figure 15).…”

Section: Diffraction Pyramidsmentioning

confidence: 99%

“…162. The first demonstration was given with two dimensional Si pyramids on top of a Mo/Si multilayer.…”

Section: Diffraction Pyramidsmentioning

confidence: 99%

“…It suppressed the reflectance of the full UV band (k ¼ 100-400 nm) down to below 10% as shown in Figure 16. 162 To avoid the XUV absorption in the silicon, a multilayer pyramid structure can be used (Figure 15(b)). In this case, the XUV light is also reflected by the multilayer within the pyramids in principle resulting in a lossless system.…”

Section: Diffraction Pyramidsmentioning

confidence: 99%

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Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Section: Diffraction Pyramidsmentioning

confidence: 99%

“…162. The first demonstration was given with two dimensional Si pyramids on top of a Mo/Si multilayer.…”

Section: Diffraction Pyramidsmentioning

confidence: 99%

Section: Diffraction Pyramidsmentioning

confidence: 99%

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Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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“…Ceramabond Sapphire Optical fiber 75,76 . These devices yield 470% EUV reflectivity, although 75% yield is theoretically possible with superior mirror surface protection and new absorber and spacer material layers.…”

Section: Ti Ptmentioning

confidence: 99%

Precision in harsh environments

2016

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Microsystems are increasingly being applied in harsh and/or inaccessible environments, but many markets expect the same level of functionality for long periods of time. Harsh environments cover areas that can be subjected to high temperature, (bio)-chemical and mechanical disturbances, electromagnetic noise, radiation, or high vacuum. In the field of actuators, the devices must maintain stringent accuracy specifications for displacement, force, and response times, among others. These new requirements present additional challenges in the compensation for or elimination of cross-sensitivities. Many state-of-the-art precision devices lose their precision and reliability when exposed to harsh environments. It is also important that advanced sensor and actuator systems maintain maximum autonomy such that the devices can operate independently with low maintenance. The next-generation microsystems will be deployed in remote and/or inaccessible and harsh environments that present many challenges to sensor design, materials, device functionality, and packaging. All of these aspects of integrated sensors and actuator microsystems require a multidisciplinary approach to overcome these challenges. The main areas of importance are in the fields of materials science, micro/nano-fabrication technology, device design, circuitry and systems, (first-level) packaging, and measurement strategy. This study examines the challenges presented by harsh environments and investigates the required approaches. Examples of successful devices are also given.

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“…Besides absorptive filters that block wider spectral ranges, XUV monitoring and metrology is making use mainly of periodic multilayer mirrors for selective reflection [5][6][7][8][9][10][11] of a desired, narrowband wavelength interval. However, with periodic layers, the shape of the spectral transmission peak is fixed due to the periodicity of the layer stack.…”

Section: Introductionmentioning

confidence: 99%

Reflective aperiodic multilayer filters for metrology at XUV sources

et al. 2020

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We present a general method for designing XUV aperiodic multilayer mirrors that can mimic a given target spectrum, specifically, the spectral transmission of an XUV optical system. The method is based on minimizing a merit function and using fidelity parameters that quantify the matching of the multilayer reflectivity spectrum with that of the target spectrum. To assess the feasibility of fabricating such a system, we show how to reduce the layer-to-layer thickness variations throughout the aperiodic layer stack. We demonstrate the design method using an example of an EUV optical system composed of 12 identical Mo/Si multilayer mirrors having a reflectivity peak at 13.5 nm. We found that the target spectrum can be mimicked with high fidelity either with a single reflection at an aperiodic multilayer mirror combined with standard absorbing filters or, if required, with two subsequent reflections at a mimic mirror. These examples demonstrate the applicability for metrology at XUV sources, including spectrally proper source imaging. Because our approach is of general applicability, the process can be used to mimic any other narrowband, single-peaked target spectrum in the XUV region.

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UV spectral filtering by surface structured multilayer mirrors

Cited by 12 publications

References 22 publications

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Precision in harsh environments

Reflective aperiodic multilayer filters for metrology at XUV sources

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