UV/ozone-assisted tribochemistry-induced nanofabrication on Si(100) surfaces

Wang, Hongbo; Yu, Bingjun; Jiang, Shulan; Jiang, Liang; Qian, Linmao

doi:10.1039/c7ra07198a

Cited by 22 publications

(18 citation statements)

References 27 publications

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“…This indicates that o DMS covers the top surface of the thin film due to its lower surface free energy. After RIE, the WCA of the Glc 1 - b -DMS n - b -Glc 1 thin film was determined to be 83.9°, which was in close agreement with that of SiO 2 (87.5°) [ 63 ]. These findings indicated that the saccharide domain was removed selectively and the o DMS segment was converted to SiO 2 .…”

Section: Resultsmentioning

confidence: 66%

Fabrication of Ultrafine, Highly Ordered Nanostructures Using Carbohydrate-Inorganic Hybrid Block Copolymers

et al. 2022

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Block copolymers (BCPs) have garnered considerable interest due to their ability to form microphase-separated structures suitable for nanofabrication. For these applications, it is critical to achieve both sufficient etch selectivity and a small domain size. To meet both requirements concurrently, we propose the use of oligosaccharide and oligodimethylsiloxane as hydrophilic and etch-resistant hydrophobic inorganic blocks, respectively, to build up a novel BCP system, i.e., carbohydrate-inorganic hybrid BCP. The carbohydrate-inorganic hybrid BCPs were synthesized via a click reaction between oligodimethylsiloxane with an azido group at each chain end and propargyl-functionalized maltooligosaccharide (consisting of one, two, and three glucose units). In the bulk state, small-angle X-ray scattering revealed that these BCPs microphase separated into gyroid, asymmetric lamellar, and symmetric lamellar structures with domain-spacing ranging from 5.0 to 5.9 nm depending on the volume fraction. Additionally, we investigated microphase-separated structures in the thin film state and discovered that the BCP with the most asymmetric composition formed an ultrafine and highly oriented gyroid structure as well as in the bulk state. After reactive ion etching, the gyroid thin film was transformed into a nanoporous-structured gyroid SiO2 material, demonstrating the material’s promising potential as nanotemplates.

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Section: Resultsmentioning

confidence: 66%

Fabrication of Ultrafine, Highly Ordered Nanostructures Using Carbohydrate-Inorganic Hybrid Block Copolymers

et al. 2022

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“…Although it was not fully clear, the increase of the roughness with the treatment time could be partly attributed to further oxidation and photocorrosion of glass surface when it occurred more than 10 min [23]. It has been reported that hydrophilic hydroxyl groups can be generated on substrate surface during UVO treatment, which lead to the reduction of water contact angle of substrate surface [11,24]. On the other hand, the water contact angles of glass decreased drastically from 54 • to 9 • with the UVO treatment from 0 to 10 min, and then the contact angles continued to decrease (Figure 1).…”

Section: Pretreatment With Uv/ozone Exposurementioning

confidence: 95%

“…The mechanism of UVO-assisted rapid formation of high-quality PFDS SAM on glass surface is shown in Figure 4. The photo-oxidation reaction of UVO treatment is indispensable for rapid formation of high-quality PFDS SAM on a glass surface [11]. As illustrated in Figure 4a, the photo-oxidation reaction of UVO treatment can be summarized as surface contaminant decomposition and surface hydroxylation.…”

Section: Uv/ozone-assisted Rapid Formation Of Pfds Sammentioning

confidence: 99%

“…Compared with other methods such as hydrofluoric (HF) solution and high velocity air jets, UVO treatment generates little toxic or harmful gases and no waste liquid during the cleaning process, and can even produce near-atomically clean surfaces in air or in a vacuum system at ambient temperature. Aside from surface cleaning, UVO can also be employed in surface modification and rapid nanofabrication on the basis of selective etching [11][12][13]. It is noted that material surface after UVO treatment exhibits more hydrophilic tendencies, which may be attributed to the hydroxylation of surface atoms during processing [14,15], and the hydroxyl group is believed to be one of the most chemically reactive groups.…”

Section: Introductionmentioning

confidence: 99%

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UV/Ozone-Assisted Rapid Formation of High-Quality Tribological Self-Assembled Monolayer

Fan

Zhi

et al. 2019

Coatings

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UV/ozone (UVO)-assisted formation of self-assembled monolayer (SAM) of 1H,1H,2H,2H-perfluorodecyltriethoxysilane (PFDS) was prepared on a glass surface. The effect of UVO exposure time on surface roughness and hydrophilicity was investigated through goniometer and atomic force microscope (AFM), and deposition time-dependent SAM quality was detected by AFM and X-ray photoelectron spectroscopy (XPS). The glass surface became smooth with UVO radiation after 10 min, and the hydrophilicity was also improved after the treatment. Confirmed by surface topography detection and chemical composition analysis, a high-quality SAM can be formed rapidly on glass with 10 min UVO treatment followed by 2 h deposition in PFDS solution. Excellent tribological performances of SAM coated with UVO treatment glass were demonstrated by friction and wear tests on AFM compared to film-deposited glass without UVO treatment and original glass. The study sheds a light on preparing high-quality lubrication and antiwear self-assembled films on the surface of engineering materials.

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“…Wang et al [76] developed a UV/ozone-assisted tribochemistry-induced selective etching approach for the fabrication on silicon surface. UV/ozone system was used for the preparation of SiO x film on surface, and the oxidation film was demonstrated to be more beneficial for subsequent fabrication in contrast with dry, chemical, and thermal plasma-assisted oxidation.…”

Section: Tribochemistry-induced Selective Etchingmentioning

confidence: 99%

Friction-Induced Nanofabrication: A Review

Qian

2021

Chin. J. Mech. Eng.

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As the bridge between basic principles and applications of nanotechnology, nanofabrication methods play significant role in supporting the development of nanoscale science and engineering, which is changing and improving the production and lifestyle of the human. Photo lithography and other alternative technologies, such as nanoimprinting, electron beam lithography, focused ion beam cutting, and scanning probe lithography, have brought great progress of semiconductor industry, IC manufacturing and micro/nanoelectromechanical system (MEMS/NEMS) devices. However, there remains a lot of challenges, relating to the resolution, cost, speed, and so on, in realizing high-quality products with further development of nanotechnology. None of the existing techniques can satisfy all the needs in nanoscience and nanotechnology at the same time, and it is essential to explore new nanofabrication methods. As a newly developed scanning probe microscope (SPM)-based lithography, friction-induced nanofabrication provides opportunities for maskless, flexible, low-damage, low-cost and environment-friendly processing on a wide variety of materials, including silicon, quartz, glass surfaces, and so on. It has been proved that this fabrication route provides with a broad application prospect in the fabrication of nanoimprint templates, microfluidic devices, and micro/nano optical structures. This paper hereby involved the principals and operations of friction-induced nanofabrication, including friction-induced selective etching, and the applications were reviewed as well for looking ahead at opportunities and challenges with nanotechnology development. The present review will not only enrich the knowledge in nanotribology, but also plays a positive role in promoting SPM-based nanofabrication.

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UV/ozone-assisted tribochemistry-induced nanofabrication on Si(100) surfaces

Abstract: UV/ozone oxidation provides a simple and efficient method to prepare super-hydrophilic SiOx films for tribochemistry-induced nanofabrication on Si substrates.

Cited by 22 publications

References 27 publications

Fabrication of Ultrafine, Highly Ordered Nanostructures Using Carbohydrate-Inorganic Hybrid Block Copolymers

Fabrication of Ultrafine, Highly Ordered Nanostructures Using Carbohydrate-Inorganic Hybrid Block Copolymers

UV/Ozone-Assisted Rapid Formation of High-Quality Tribological Self-Assembled Monolayer

Friction-Induced Nanofabrication: A Review

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