UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing

Ji, Ran; Hornung, Michael; Verschuuren, Marc A.; Laar, Robert van de; Eekelen, Jan van; Plachetka, Ulrich; Moeller, Michael; Moormann, Christian

doi:10.1016/j.mee.2009.11.134

Cited by 131 publications

(88 citation statements)

References 7 publications

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“…KarlSuss GmbH has studied the replication of nanoholes (340 nm of diameter) in AMONIL resist. They obtained a diameter of 340 nm ± 5%, and a period uniformity of 2 nm over a 6 inch area [32]. During the imprint step, the resist flow depends strongly on the applied pressure and determines the accuracy on the dimensions of the imprinted nanostructures.…”

Section: Optimization Of Pressure and Decreasing Of Possible Deformatmentioning

confidence: 99%

Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography

Barbillon¹

2013

Updates in Advanced Lithography

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Section: Optimization Of Pressure and Decreasing Of Possible Deformatmentioning

confidence: 99%

Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography

Barbillon¹

2013

Updates in Advanced Lithography

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“…In our work, we present wafer-scale plasmonic colour filters with an active area of up to 145 cm 2 , fabricated by a soft lithography technique (UV-enhanced substrate conformal imprint lithography, UV-SCIL [27]). The nanoapertures were defined by replicating a mould pattern into the organic resist Katiobond 110707 (DELO Industrial Adhesives) and the following dry etching of aluminium.…”

Section: Introductionmentioning

confidence: 99%

Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

et al. 2017

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This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm2 which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extended RCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp® instead of often applied PECVD-SiO2 was investigated.

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“…UV-Substrate Conformal Imprint Lithography (UV-SCIL), a large area 3D NanoImprint methodology, provides the possibility to structure multiple arrays of FP filter cavities with different heights in a single step Ji et al 2010). Figure 1 shows 12 FP filters with distinct cavity heights and their resulting filter lines.…”

Section: Introductionmentioning

confidence: 99%

Highly uniform residual layers for arrays of 3D nanoimprinted cavities in Fabry–Pérot-filter-array-based nanospectrometers

et al. 2015

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Miniaturized optical spectrometers can be implemented by an array of Fabry-Pérot (FP) filters. FP filters are composed of two highly reflecting parallel mirrors and a resonance cavity. Each filter transmits a small spectral band (filter line) depending on its individual cavity height. The optical nanospectrometer, a miniaturized FPbased spectrometer, implements 3D NanoImprint technology for the fabrication of multiple FP filter cavities in a single process step. However, it is challenging to avoid the dependency of residual layer (RL) thickness on the shape of the printed patterns in NanoImprint. Since in a nanospectrometer the filter cavities vary in height between neighboring FP filters and, thus, the volume of each cavity varies causing that the RL varies slightly or noticeably between different filters. This is one of the few disadvantages of NanoImprint using soft templates such as substrate conformal imprint lithography which is used in this paper. The advantages of large area soft templates can be revealed substantially if the problem of laterally inhomogeneous RLs can be avoided or reduced considerably. In the case of the nanospectrometer, non-uniform RLs lead to random variations in the designed cavity heights resulting in the shift of desired filter lines. To achieve highly uniform RLs, we report a volume-equalized template design with the lateral distribution of 64 different cavity heights into several units with each unit comprising four cavity heights. The average volume of each unit is kept constant to obtain uniform filling of imprint material per unit area. The imprint results, based on the volume-equalized template, demonstrate highly uniform RLs of 110 nm thickness.

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UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing

Cited by 131 publications

References 7 publications

Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography

Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography

Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

Highly uniform residual layers for arrays of 3D nanoimprinted cavities in Fabry–Pérot-filter-array-based nanospectrometers

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