2024
DOI: 10.1016/j.cej.2024.149877
|View full text |Cite
|
Sign up to set email alerts
|

Utilizing hydrolysis resistance of compressed Li3PS4 films to eradicate surface hydroxyls and form conformal coatings through atomic layer deposition

Ronghan Qiao,
Hailong Yu,
Liubin Ben
et al.
Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
references
References 53 publications
0
0
0
Order By: Relevance