Using Mather-type plasma focus device for surface modification of AISI304 Steel

Al‐Hawat, Sh.; Soukieh, M.; Kharoub, M. Abou; Alsadat, W.

doi:10.1016/j.vacuum.2009.12.009

Cited by 25 publications

(6 citation statements)

References 12 publications

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“…This is due to Ni. 10 Diffraction pattern shows the presence of peaks at 2θ = 44.48° and 2θ = 91.43°, which corresponds to phases Ni 3 N(111) 23 and Ni 3 N(004) 22 respectively. The diffraction peak of the 30 focus shots shows the presence of AlNi 3 (220) at 2θ = 75.29° (refer to JCPDS card no.00-050-1265).…”

Section: Resultsmentioning

confidence: 99%

“…Therefore, ion beams of DPF device have drawn considerable attention in surface modification in recent years. [7][8][9][10] Al-Hawat et al 10 used a 2.8 kJ DPF to surface modification of AISI304 steel. They reported that the surface hardness of AISI304 steel was increased by *175% after plasma treatment and the thickness of the treated layers was *1-2 mm.…”

Section: Introductionmentioning

confidence: 99%

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Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Habibi

Laktarashi

Bordbar

2016

Corrosion Engineering, Science and Technology

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In this paper, the deposition of Ni-Al-N coatings on Nimonic 75 substrates using a 4 kJ plasma focus device for 30 shots is investigated. The results obtained by field emission scanning electron microscopy and X-ray diffraction (XRD) tests confirm the formation of Ni-Al-N nanoparticles on the surface of the samples with an average crystalline size of ,20-50 nm. The hot corrosion rate was determined by measuring the weight gain of the samples at 8008C. Improvement of charge transfer resistance by electrochemical impedance spectroscopy reveals that the coated layer can significantly increase resistance to corrosion.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Habibi

Laktarashi

Bordbar

2016

Corrosion Engineering, Science and Technology

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“…In each plasma focus shot, ions and electrons are emitted in more than one bunchs with periods of few to tens of nanoseconds. The formation of TaN can arise by two mechanisms: (1) formation of TaN during the same focus shot due to reaction between the ablated tantalum ions with energetic nitrogen ions (2) formation of TaN due to nitriding of tantalum atoms by energetic nitrogen ions from the following focus shot [38].…”

Section: Xrd-analysismentioning

confidence: 99%

Growth and Study of Plasma Assisted Nanostructured Hard Tantalum Nitride Thin Films

et al. 2015

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Plasma assisted growth of tantalum nitride films in Mather type dense plasma focus device is reported in the current research. Effects of variation in number of plasma focus shots on structural, compositional and mechanical characteristics of synthesized tantalum nitride thin films have been investigated. Better crystallinity with thermally assisted coagulated growth patterns are observed for films synthesized by maximum (fifteen) plasma focus shots. Nano-hardness of films is observed to increase with increasing plasma focus shots whereas the maximum nanohardness of 16.24 ± 01.54 GPa is observed for film synthesized with fifteen plasma focus shots. Film roughness investigated by atomic force microscopy revealed influence of variation in plasma focus shots on surface roughness which is found to be increased with increase in plasma focus shots.

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“…In the case of PF device with nitrogen and titanium fitted anode, the emitted electrons and nitrogen ions could sputter the anode material and form corona plasma above the anode surface. The formed plasma includes titanium atoms and high energy titanium ions in addition to the fast electrons (19). Primarily, two processes occur on the SS316L surface during collision of the accelerated ions with the samples.…”

Section: Mechanism Of the Surface Modification By Pf Devicementioning

confidence: 99%

The effect of TiN nanoparticles deposition with different number of shots on SS316L by plasma focus device

Omrani¹,

Amrollahi²,

Habibi³

2013

Radiation Effects and Defects in Solids

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In this paper, we present the result of TiN nanocrystalline deposition on SS316L, using a 4 kJ plasma focus (PF) device for 10, 20, and 30 focus shots. The effect of different number of focus shots on micro-structural changes of thin film is characterized by field emission scanning electron microscope. Existence of grains in different size confirms the formation of TiN nanocrystals on the surface of SS316L substrate. X-ray diffraction (XRD) reveals the formation of a nanocrystalline titanium nitride coating on the surface of SS316L samples. The crystalline size of TiN obtained from XRD data is strongly dependent on the number of focus shots. Thickness of the elements found on the surface of the treated sample that obtain by Rutherford backscattering spectroscopy (RBS) analysis is in the range of 150 × 10 15 − 200 × 10 15 atoms/cm 2 . All the existence elements in the coated samples are identified by Particle Induced X-ray Emission (PIXE) spectra. Investigation on the corrosion resistance of TiN coatings was performed using an electrochemical potentiodynamic polarization. Our results suggest that TiN nanocrystalline implantation with proper ion fluences using PF can significantly improve the corrosion resistance of SS316L.

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Using Mather-type plasma focus device for surface modification of AISI304 Steel

Cited by 25 publications

References 12 publications

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Growth and Study of Plasma Assisted Nanostructured Hard Tantalum Nitride Thin Films

The effect of TiN nanoparticles deposition with different number of shots on SS316L by plasma focus device

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