Using Machine Learning Classifiers to Recognize the Mixture Control Chart Patterns for a Multiple-Input Multiple-Output Process

Abstract

A statistical process control (SPC) chart is one of the most important techniques for monitoring a process. Typically, a certain root cause or a disturbance in a process would result in the presence of a systematic control chart pattern (CCP). Consequently, the effective recognition of CCPs has received considerable attention in recent years for their potential use in improving process quality. However, most studies have focused on the recognition of CCPs for SPC applications alone. Specifically, even though numerous studies have addressed the increased use of the SPC and engineering process control (EPC) mechanisms, very little research has discussed the recognition of CCPs for multiple-input multiple-output (MIMO) systems. It is much more difficult to recognize the CCPs of an MIMO system since two or more disturbances are simultaneously involved in the process. The purpose of this study is thus to propose several machine learning (ML) classifiers to overcome the difficulties in recognizing CCPs in MIMO systems. Because of their efficient and fast algorithms and effective classification performance, the considered ML classifiers include an artificial neural network (ANN), support vector machine (SVM), extreme learning machine (ELM), and multivariate adaptive regression splines (MARS). Furthermore, one problem may arise due to the existence of embedded mixture CCPs (MCCPs) in MIMO systems. In contrast to using typical process outputs alone in a classifier, this study employs both process outputs and EPC compensation to ensure the effectiveness of CCP recognition. Experimental results reveal that the proposed classifiers are able to effectively recognize MCCPs for MIMO systems.

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