2018
DOI: 10.1002/pssa.201800135
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Using HCl to Control Silver Dissolution in Metal-Assisted Chemical Etching of Silicon

Abstract: Metal assisted chemical etching (MACE) is a viable route to cheaply and easily produce large‐scale arrays of SiNW for, e.g., solar cell applications. However, control over nanostructure dimensions such as length, width, and angle is not simple, particularly with the cheaper silver‐based MACE. Even an initially well‐defined silver catalyst will dissolve uncontrollably under the influence of a variety of conditions acting concurrently, including H2O2 concentration. The authors prove here that HCl can be used, no… Show more

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Cited by 5 publications
(2 citation statements)
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“…At pH 4.5, around 70 wt.% of silver was lost, while at basic pH the loss was 42 wt.% (in the case of using pH 9) and 30 wt.% using pH 14. The acidification of the aqueous medium using HCl led to losses of more than 70 wt.% probably because the dissolution of silver is promoted under acidic conditions and the solubility of PEI increased [ 59 , 60 , 61 , 62 ]. Under alkaline conditions, the protonation of the amino groups is lost and therefore the interaction with the fabrics as well as with the AgNPs would vanish.…”
Section: Resultsmentioning
confidence: 99%
“…At pH 4.5, around 70 wt.% of silver was lost, while at basic pH the loss was 42 wt.% (in the case of using pH 9) and 30 wt.% using pH 14. The acidification of the aqueous medium using HCl led to losses of more than 70 wt.% probably because the dissolution of silver is promoted under acidic conditions and the solubility of PEI increased [ 59 , 60 , 61 , 62 ]. Under alkaline conditions, the protonation of the amino groups is lost and therefore the interaction with the fabrics as well as with the AgNPs would vanish.…”
Section: Resultsmentioning
confidence: 99%
“…[126] Another useful additive for MaCE is chloride, such as HCl and NaCl. [127,128] These chlorides can easily dissociate into ions, and those ions interfere with reactive species in the MaCE. In Ag-based MaCE, it is well known that Ag catalyst can easily be dissolved by H 2 O 2 ; the dissolved Ag + ions sit at any exposed Si surface and start unwanted MaCE reaction there.…”
Section: Etch Additivesmentioning
confidence: 99%