“…Many previous studies have conducted experiments to characterize the performance and reliability features of planar and 3D NAND flash and make meticulous analyses [23,26,32,33]. It is a common practice to understand the flash retention errors through high-temperature baking processes [2,3,7,32,33]. According to Arrhenius' model [2,3,19,28], the retention loss process can be accelerated through baking since high temperatures increase the mobility of electrons in flash cells, which accelerates the charge leakage speed.…”