Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process

Chuang, Ya-Mi; Jack, Kevin S.; Cheng, Han-Hao; Whittaker, Andrew K.; Blakey, Idriss

doi:10.1002/adfm.201200564

Cited by 20 publications

(21 citation statements)

References 76 publications

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“…26,27 Continuous efforts have been devoted to explore the versatility of this photo-induced technique over acrylate monomers, including solketal acrylate, hydroxyethyl acrylate and glycidyl acrylate homopolymer, or even poly(methyl acrylate)-b-poly(solketal acrylate). 40,41 Many of these applications require polymers to self-assemble into specific conformations. 29,30 Followed by hydrolysis of the tert-butyl group to the hydroxyl group the resulting decablock copolymer has shown a complex thermo and pH-responsive self-assembled behavior.…”

Section: Introductionmentioning

confidence: 99%

Ligand switch in photoinduced copper-mediated polymerization: synthesis of methacrylate–acrylate block copolymers

et al. 2015

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The use of photo-induced copper-mediated radical polymerization ( photoCMP) to synthesize mixed acrylate/methacrylate (methyl acrylate, MA and methyl methacrylate, MMA) block copolymers is investigated. Reactions in which only one type of ligand (Me 6 TREN) is used lead to unsuccessful outcomes of polymerization due to a mismatch in reactivity of the two monomers. A ligand exchange to PMDETA for methacrylate is required to obtain good block structures. Due to insufficient re-initiation of polyacrylates, methyl methacrylate needs to be polymerized first, before acrylate can be added for chain extension. A halogen exchange with CuCl is found to be beneficial to increase the re-initiation behaviour of the polyacrylate with respect to the acrylate chain propagation, but inherently compromises the livingness of the polymerization. Successful synthesis of block copolymers is only observed when the PMMA block is polymerized first and if all PMDETA ligand and residual monomer are removed prior to acrylate chain extension. The batch-type photoreactions are then transferred to a continuous flow tubular photoreactor, which leads to a significant acceleration of polymerizations, concomitant reduction in product dispersity and largely simplified block copolymer synthesis conditions. † Electronic supplementary information (ESI) available. See

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Section: Introductionmentioning

confidence: 99%

Ligand switch in photoinduced copper-mediated polymerization: synthesis of methacrylate–acrylate block copolymers

et al. 2015

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“…14,15 On the other hand, graphoepitaxy uses surface topography, e.g., a printed resist, to guide self-assembly and align the phase-separated domains. [16][17][18][19][20] Polystyrene-block-poly(methyl methacrylate), or PS-b-PMMA, is currently the most widely studied system, where DSA of PS lines with a pitch of ∼24 nm has been demonstrated. 21 There is also a significant body of knowledge relating to optimization of processing and integration with manufacturing processes.…”

Section: Introductionmentioning

confidence: 99%

Can ionic liquid additives be used to extend the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly?

Bennett

Pei

Cheng

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Directed self-assembly (DSA) is a promising approach for extending conventional lithographic techniques by being able to print features with critical dimensions under 10 nm. The most widely studied block copolymer system is polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA). This system is well understood in terms of its synthesis, properties, and performance in DSA. However, PS-b-PMMA also has a number of limitations that impact on its performance and hence scope of application. The primary limitation is the low Flory-Huggins polymer-polymer interaction parameter (χ), which limits the size of features that can be printed. Another issue with block copolymers in general is that specific molecular weights need to be synthesized to achieve desired morphologies and feature sizes. Here we explore blending ionic liquid (IL) additives with PS-b-PMMA to increase the χ parameter. ILs have a number of useful properties that include negligible vapor pressure, tunable solvent strength, thermal stability, and chemical stability. The blends of PS-b-PMMA with an IL selective for the PMMA block allowed the resolution of the block copolymer to be improved. Depending on the amount of additive, it is also possible to tune the domain size and the morphology of the systems. These findings may expand the scope of PS-b-PMMA for DSA.

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“…Cryo-TEM of the aqueous solutions revealed that polymersomes had formed with a diameter of 18 ± 2 nm. [47] This is represented schematically in Figure 2 A. ,J 3 . K`: _ ie',«9r i. a flat surface or (C) a rough surface.…”

Section: Solution Properties Of the Block Copolymer And Adhesion To Pmentioning

confidence: 99%

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

Chuang

Cheng

Jack

et al. 2013

Alternative Lithographic Technologies V

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Overcoming the resolution-LER-sensitivity trade-off is a key challenge for the development of novel resists and processes that are able to achieve the ITRS targets for future lithography nodes. Here, we describe a process that treats lithographic patterns with aqueous solutions of block copolymers to facilitate a reduction in LER. A detailed understanding of parameters affecting adhesion and smoothing is gained by first investigating the behavior of the polymers on planar smooth and rough surfaces. Once healing was established in these model systems the methodology is tested on lithographically printed features where significant healing is observed, making this a promising technology for LER remediation.

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Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process

Cited by 20 publications

References 76 publications

Ligand switch in photoinduced copper-mediated polymerization: synthesis of methacrylate–acrylate block copolymers

Ligand switch in photoinduced copper-mediated polymerization: synthesis of methacrylate–acrylate block copolymers

Can ionic liquid additives be used to extend the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly?

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

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