Uranium electrodeposition at boron-doped diamond electrodes

Abstract

The uranium electrodeposition process on a boron-doped diamond electrode (BDD) surface at varying potentials as a means of environmental uranium remediation has been studied. The chronoamperometry technique was employed for the electrodeposition process, applying potentials ranging from − 0.60V to -2.00V vs. the reversible hydrogen electrode (RHE). A 2mM uranyl acetate dihydrate (UO 2 (C 2 H 3 O 2 ) 2 •2H 2 O) solution in 0.1M KClO 4 served as a model uranyl ion (UO 2 2+ ) source. Analysis using scanning electron microscopy, energy-dispersive X-ray uorescence spectroscopy, and atomic force microscopy (AFM) con rmed the presence of uranium and the formation of a thin layer on the electrode surface. Roughness measurements obtained through AFM analysis at different applied potentials vs. RHE were compared before and after uranium electrodeposition at BDD electrodes. Additionally, the identi cation of various uranium oxides resulting from the electrodeposition procedures was conducted using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. These analyses revealed the presence of UO 2 , UO 3 , and U 3 O 8 on the BDD electrode surface due to the electrochemical deposition process, with a notable proportion of U 3 O 8 observed. Ultimately, the optimal potential for e cient U 6+ remediation from aqueous media and the formation of a uniform thin layer conducive to nuclear technology development was determined to be -1.75V vs. RHE.