Plasmodium falciparum
parasites undergo multiple genome duplication events during their development. Within the intraerythrocytic stages, parasites encounter an oxidative environment and
DNA
synthesis necessarily proceeds under these circumstances. In addition to these conditions, the extreme
AT
bias of the
P. falciparum
genome poses further constraints for
DNA
synthesis. Taken together, these circumstances may allow appearance of damaged bases in the
Plasmodium
DNA
. Here, we focus on uracil that may arise in
DNA
either via oxidative deamination or thymine‐replacing incorporation. We determine the level of uracil at the ring, trophozoite, and schizont intraerythrocytic stages and evaluate the base‐excision repair potential of
P. falciparum
to deal with uracil‐
DNA
repair. We find approximately 7–10 uracil per million bases in the different parasite stages. This level is considerably higher than found in other wild‐type organisms from bacteria to mammalian species. Based on a systematic assessment of
P. falciparum
genome and transcriptome databases, we conclude that uracil‐
DNA
repair relies on one single uracil‐
DNA
glycosylase and proceeds through the long‐patch base‐excision repair route. Although potentially efficient, the repair route still leaves considerable level of uracils in parasite
DNA
, which may contribute to mutation rates in
P. falciparum
.