Uniformity of PZT Thin Films Prepared by MOCVD on 8"B Substrate

Thin-Film Process Technology for Ferroelectric Application

“…Consequently, in-plane uniformity within ±3% was achieved for both film thicknesses and the composition as shown inFig. 12 [10].…”

“…Plasma density (cm -3 ) 1×10 10 ~ 1×10 11 5×10 9 ~ 5×10 10 Operating pressure (Pa) 0.07<P<7 0.5<P<50 This section explains high temperature etching system ULHITE series made by ULVAC, Inc. This etching module is equipped with ISM plasma source.…”