Understanding the thermal annealing process on metallic thin films

Alonzo-Medina, G. M.; González-González, Antonio; Sacedón, J. L.; Oliva, A.I.

doi:10.1088/1757-899x/45/1/012013

Cited by 20 publications

(15 citation statements)

References 7 publications

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“…Sputtering is a physical vapor deposition method that may achieve quite a uniform coating over quite large areas by controlling the surface roughness and grain sizes [25]. The increased temperature of the surface during the process causes an oxygen migration towards the Mo coating that, together with the vacuum conditions, may affect the presence of the multiphase structure of the films.…”

Section: Molybdenum Coatingsmentioning

confidence: 99%

Materials and Breakdown Phenomena: Heterogeneous Molybdenum Metallic Films

et al. 2017

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Technological activities to design, manufacture, and test new accelerating devices using different materials and methods is under way all over the world. The main goal of these studies is to increase the accelerating gradients and reduce the probability of radio-frequency (RF) breakdown. Indeed, it is still not clear why, by increasing the intensity of the applied field, intense surface damage is observed in copper structures, limiting the lifetime and, therefore, the practical applications. A possible solution is represented by a coating of a relatively thick layer of molybdenum in order to improve the breakdown rate. molybdenum can be reliably grown on different substrates with a negligible strain and, for thicknesses up to 600 nm, with a resistivity <100-150·µΩ cm. Moreover, Mo coatings with controlled composition, internal stress, and roughness may allow improving thermo-mechanical properties reaching values not attainable by uncoated copper. Although the Mo conductivity remains lower compared to Cu, a Mo coating represents a very interesting option for high gradient accelerator components manufactured in copper.

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Section: Molybdenum Coatingsmentioning

confidence: 99%

Materials and Breakdown Phenomena: Heterogeneous Molybdenum Metallic Films

et al. 2017

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“…Annealing process is seen to decrease the sheet resistivity of undoped SnO 2 thin film slightly. This is because annealing process is ascribed to decrease intrinsic stress, improve on lattice mismatch and create longer mean paths for free electrons hence increasing their mobility thereby improving on the electrical conductivity of the thin films [28,35]. When the thin films were passivated, there was a slight increase in resistivity for the passivated samples which is attributed to increase in the formation of nanocrystalline grains [33] or effects arising from annealing the thin film in an oxygen deficient atmosphere [7].…”

Section: Optical Characterizationmentioning

confidence: 99%

“…Figure 8 shows the effect of annealing and passivation on F: SnO 2 thin films prepared at 16.41 at% F which had a low resistivity of 0.00075 Ωcm. Annealing effects led to further decrease in resistivity of F: SnO 2 thin films which is attributed to increase in crystallinity, hence mobility of free charge carriers [35,36]. Passivation had an opposite effect which is attributed to increase in the formation of nanocrystalline grains [33] or effects arising from annealing the thin film in an oxygen deficient atmosphere [7].…”

Section: Optical Characterizationmentioning

confidence: 99%

“…from 350nm to 1800nm increased slightly as a result of annealing and thereafter, it increased again slightly upon passivating the annealed thin films. Annealing and passivation process makes the Pd:SnO 2 more crystalline hence becoming more transparent [35,36]. Annealing and passivation on the thin films caused a slight variation on the reflectance of the thin films.…”

Section: Optical Characterizationmentioning

confidence: 99%

“…Annealing and passivation had a significant improvement on conductivity of Pd:SnO 2 as seen in figure 13. This is attributed to increase in mobility of free charge carriers due to improved crystallinity of the thin films [35,36]. …”

Section: Optical Characterizationmentioning

confidence: 99%

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Effect of Annealing and Surface Passivation on Doped SnO2 Thin Films Prepared by Spray Pyrolysis Technique

Mwathe¹

2015

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Abstract:In this study doped SnO 2 thin films have been prepared by spray pyrolysis technique using an alcoholic precursor solution consisting of stannic chloride (SnCl 4 .5H 2 O), ammonium fluoride (NH 4 F) and palladium chloride (PdCl 2 ). Optimization on the deposition parameters was done so as to obtain high quality thin films. The effect of varying the Fluorine content on the optoelectronic properties of F: SnO 2 thin films was studied. Data for transmittance and reflectance in the wavelength range from 300nm -2500nm was obtained using the solid spec 3700DUV spectrophotometer. Electrical characterization of the thin films was done using the four point probe method at room temperature. Post deposition treatment of the thin films by annealing in air then passivating in nitrogen gas environment was done in a tube furnace at 450 0 C. Sheet resistivity for the as prepared F: SnO 2 was found to be 0.4599 Ωcm and 0.00075 Ωcm being the highest and lowest sheet resistivity at 22.74 at% F and 16.41at% F doping in SnO 2 respectively. Low sheet resistivity of F: SnO 2 thin films is due substitutional incorporation of F ions instead of oxygen ions into the crystal lattice of SnO 2 thin films which increases free carrier concentration. The effect of annealing generally was found to improve on the electrical conductivity of the thin films which is due to increase in carrier mobility and density. Passivation on the other hand had a slight opposite effect. Effects of annealing and passivation on doped SnO 2 thin films band gap energy and their transparency was insignificant, rendering the doped SnO 2 thin films good choice for making a transparent thin film gas sensors.

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Effects of furnace temperature of stress-relief annealing on residual stress and hardness characteristics of heterogeneous materials fabricated from a DED process

Lee,

Ahn

2024

J Mech Sci Technol

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Understanding the thermal annealing process on metallic thin films

Cited by 20 publications

References 7 publications

Materials and Breakdown Phenomena: Heterogeneous Molybdenum Metallic Films

Materials and Breakdown Phenomena: Heterogeneous Molybdenum Metallic Films

Effect of Annealing and Surface Passivation on Doped SnO2 Thin Films Prepared by Spray Pyrolysis Technique

Effects of furnace temperature of stress-relief annealing on residual stress and hardness characteristics of heterogeneous materials fabricated from a DED process

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