1995
DOI: 10.1021/cm00057a018
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Understanding the Habit Modification of Ammonium Dihydrogen Phosphate by Chromium Ions Using a Dopant-Induced Charge Compensation Model

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Cited by 13 publications
(14 citation statements)
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“…However, the average mosaic spread was found to be around 66 arc sec. The data are consistent with Cr 3+ incorporating within the lattice in a substitutional site, 46 hence causing minimal disruption to the crystal lattice beyond coloration, the latter being due to the Cr 3+ incorporating in an octahedral environment 46 rather than an interstitional environment. 47,48…”
Section: B Analysis Of Pure and Cr 3+ Doped Kdp Crystalssupporting
confidence: 59%
“…However, the average mosaic spread was found to be around 66 arc sec. The data are consistent with Cr 3+ incorporating within the lattice in a substitutional site, 46 hence causing minimal disruption to the crystal lattice beyond coloration, the latter being due to the Cr 3+ incorporating in an octahedral environment 46 rather than an interstitional environment. 47,48…”
Section: B Analysis Of Pure and Cr 3+ Doped Kdp Crystalssupporting
confidence: 59%
“…Previous work on the habit modi®cation of KDP has suggested that the impurity is incorporated either interstitially (Davey & Mullin, 1974a,b, 1976Fontcuberta et al, 1978;Barret et al, 1989;Eremina et al, 2001, and references therein; or at the substitutional sites, i.e. the potassium site (Byteva, 1968) and the phosphate site (Cunningham et al, 1995).…”
Section: Introductionmentioning
confidence: 99%
“…Doping is a well-chosen and widely accepted technique for incorporating the required physical properties in a bulk material for technological applications [1][2][3]. The technique has been extensively explored to modify the properties like electrooptical (photoluminescence), conductivity and crystal growth [4].…”
Section: Introductionmentioning
confidence: 99%