2019
DOI: 10.3390/app9183645
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Understanding of Molecular Contribution of Quinhydrone/Methanol Organic Passivation for Improved Minority Carrier Lifetime on Nanostructured Silicon Surface

Abstract: In this report, we present a study of the quinhydrone/methanol (QHY/MeOH) organic passivation technique for a silicon (Si) surface. The roles of p-benzoquinone (BQ) and hydroquinone (HQ), which make up QHY, in controlling the uniformity and coverage of the passivation layer as well as the minority carrier lifetime (τeff) of Si were investigated. The uniformity and coverage of the passivation layer after treatment with diverse mixture ratios of BQ and HQ in MeOH were studied with two different atomic force micr… Show more

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Cited by 1 publication
(3 citation statements)
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“…Moreover, as proven in our previous study, the Si-SQ bond also results in the formation of an intramolecular dipole moment owing to the difference in polarity between the O-H group and the oxygen atoms present at both ends of SQ. This arrangement induces upward band bending at the Si surface, as shown in Figure 8c [66]. This upward band-bending with SQ can lead to an imbalance in the carrier concentration between electrons and holes on the Si surface, eventually lowering the surface recombination velocity and thus providing effective field effect passivation for the Si surface.…”
Section: N-si/hq-pedot:pss Interface Engineering With Benzoquinonementioning
confidence: 97%
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“…Moreover, as proven in our previous study, the Si-SQ bond also results in the formation of an intramolecular dipole moment owing to the difference in polarity between the O-H group and the oxygen atoms present at both ends of SQ. This arrangement induces upward band bending at the Si surface, as shown in Figure 8c [66]. This upward band-bending with SQ can lead to an imbalance in the carrier concentration between electrons and holes on the Si surface, eventually lowering the surface recombination velocity and thus providing effective field effect passivation for the Si surface.…”
Section: N-si/hq-pedot:pss Interface Engineering With Benzoquinonementioning
confidence: 97%
“…This made it necessary to consider two factors: (1) the formation of a passivation layer for excessive Si surface defect states and (2) improvement of the wettability of the PEDOT:PSS solution on the Si surface. Towards this purpose, we developed the technology to introduce benzoquinone (BQ) for Si surface passivation during HSC fabrication [66]. Figure 8 depicts the use of BQ to passivate the unsaturated-Si atoms on the Si surface.…”
Section: N-si/hq-pedot:pss Interface Engineering With Benzoquinonementioning
confidence: 99%
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