Underpotential Deposition of Cu on Boron-Doped Diamond Thin Films

Abstract

The deposition of copper on boron-doped diamond thin-film electrodes was investigated. Three kinds of boron-doped diamond films were studied: a film deposited on a silicon wafer, a second grown on a tungsten substrate, and a third, similar to the first, but surface-amorphized (bombarded) by ion beam irradiation. The films were investigated by a number of techniques. Linear potential sweep experiments in 0.1 M H 2 SO 4 + 0.001 M CuSO 4 solution showed that, besides the peak due to bulk copper deposition, a "prewave" peak is present in the voltammogram of the first two electrodes and not in the third one. An electrochemical activation at negative potential was imperative for the appearance of the "prewave" peak. The amount of copper involved was less than 2% of a monolayer. The comparison between spectroscopic and electrochemical investigations leads to the interpretation that the "prewave" peak corresponds to an underpotential deposition of Cu on graphitic inclusions in the diamond electrode, or along the grain boundaries, probably by intercalation.

Bromate removal by electrochemical reduction at boron-doped diamond electrode

“…Bouamrane et al studied the effectiveness of BDD for reducing nitrate to ammonia [22]. Several studies have investigated metal deposition, including mercury, silver, copper, and cadmium [23,24]. Reduction of trichloroethene at BDD electrodes was also reported and production of acetate and chloride ions with no detectable intermediates was observed [25].…”

Electrochemical Detection of Trace Concentrations of Cadmium and Lead with a Boron‐Doped Diamond Electrode: Effect of KCl and KNO3 Electrolytes, Interferences and Measurement in River Water

“…For example, the simultaneous deposition of lead and copper from 0.1 M HNO 3 solutions occurred via formation of copper nuclei which were then covered by a layer of lead [27], as opposed to intermetallic mixing of the two, which was usually observed on glassy carbon electrodes [2, 7, 36 ± 38]. Other information gained from studying millimolar concentrations of metals with the BDD electrode include atomic force microscopy (AFM) profiles of the electrode surface taken during the stripping process [28], the effect of carbonyl functional groups on copper deposition from sodium sulfate solutions [29 ± 30], the underpotential deposition of copper from dilute sulfuric acid thought to occur on defects of the diamond electrode [33], and the nucleation and growth type deposition mechanism seen with lead [34 ± 35], copper [27], and silver and mercury [31].…”

Influência do eletrólito na eletrodeposição de nanopartículas de Cu sobre eletrodo de diamante dopado com boro

“…A influência do eletrólito pode ser associada pela complexação dos íons metálicos por ligantes do eletrólito, pela adsorção dos ânions do eletrólito ou, ainda, pela participação do eletrólito no transporte de massa, reduzindo o transporte por migração do íon eletroativo. 30 Apesar de encontrar na literatura trabalhos correlatos focando os estudos eletroquímicos de Cu sobre filmes de DDB, do nosso conhecimento, 21,22,[31][32][33][34][35] não foi evidenciado um estudo com o mesmo enfoque e abordagem propostos neste trabalho. Além disso, este trabalho merece uma atenção especial destacada pela criteriosa apresentação dos resultados desde a preparação e a caracterização morfológica e estrutural dos filmes de DDB, as quais são fundamentais para se garantir a reprodutibilidade e confiabilidade das respostas eletroquímicas.…”