2006
DOI: 10.1243/17403499jnn103
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Unconventional methods for forming nanopatterns

Abstract: Nanostructured materials have become an increasingly important theme in research, in no small part due to the potential impacts this science holds for applications in technology, including such notable areas as sensors, medicine, and high-performance integrated circuits. Conventional methods, such as the top-down approaches of projection lithography and scanning beam lithography, have been the primary means for patterning materials at the nanoscale. This article provides an overview of unconventional methods -… Show more

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Cited by 27 publications
(31 citation statements)
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References 732 publications
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“…Under these latter etching conditions, an effective channel length (L eff ) limit around 400 nm can be set while maintaining etching time, mask value (L mask ) and aspect ratio (vertical over lateral etch) around 2.25 min, 1 lm and 1:1, respectively. According to Stewart et al, 21 the lowest acceptable and realistic soft Sylgard 184 PDMS dimension lies around 1 lm. In this case, the latter parameters become 5.5 min and 2.5 lm for the same aspect ratio.…”
Section: Az1518 Versus Su-8mentioning
confidence: 97%
“…Under these latter etching conditions, an effective channel length (L eff ) limit around 400 nm can be set while maintaining etching time, mask value (L mask ) and aspect ratio (vertical over lateral etch) around 2.25 min, 1 lm and 1:1, respectively. According to Stewart et al, 21 the lowest acceptable and realistic soft Sylgard 184 PDMS dimension lies around 1 lm. In this case, the latter parameters become 5.5 min and 2.5 lm for the same aspect ratio.…”
Section: Az1518 Versus Su-8mentioning
confidence: 97%
“…Two approaches are commonly used for the preparation of plasmonic nanostructures: bottom-up and top-down34. The bottom-up approach involves the reduction of metal salts or assembly of nanoparticles in suspension or on the surface353637.…”
mentioning
confidence: 99%
“…37 Top-down fabrication techniques utilize different lithographic methods in order to produce patterned nanostructures whereas bottom-up methods are based on the assembly of atoms, molecules, and other components into nanostructures either on substrates or in solution. Top-down lithography methods, such as electron beam lithography, can produce plasmonic materials with great control over the size, shape, and spacing of metal nanostructures.…”
Section: Top-down Vs Bottom-upmentioning
confidence: 99%