Ultraviolet laser damage and optical properties of thin films deposited by reactive-rf-magnetron sputtering (Abstract Only)

Abstract

Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate and the change of spectral characteristics in the relative humidity. Thin films deposited by reactive-rf-magnetron sputtering improve these problems. Laser-induced damage thresholds (LIDTs) at 355nm, measured by l-on-l and R-on-l methods, of substrate and single high index zirconia, hafnia and aluminum oxide, and low-index silicon dioxide coated by magnetron sputtering, are reported.