2022
DOI: 10.3390/inorganics10120235
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Ultrathin Films of Silver by Magnetron Sputtering

Abstract: The interest in ultrathin silver (Ag) films has increased due to their high surface plasmon resonance for coatings of only a few nm. Low roughness ultrathin films of 1 to 9 nm have been deposited on different substrates, such as polyethylene terephthalate (PET) and optical glass, using radio frequency (RF) magnetron sputtering. Films show good surface plasmon resonance up to 7 nm thickness, as revealed by the ultraviolet-visible (UV-Vis) spectra. The roughness of the films, investigated by Atomic Force Microsc… Show more

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Cited by 7 publications
(5 citation statements)
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“…The surface plasma absorption on the rough Ag surface may be responsible for the difference. [ 39 ] The introduction of seed not only modify the optical properties and morphology of ultrathin Ag film but also improves the sheet resistance from 7.4 to 5.8 Ω sq −1 . After that, SSEs were fabricated by thermal vapor deposition with the guide of simulation results and theoretical analysis.…”
Section: Resultsmentioning
confidence: 99%
“…The surface plasma absorption on the rough Ag surface may be responsible for the difference. [ 39 ] The introduction of seed not only modify the optical properties and morphology of ultrathin Ag film but also improves the sheet resistance from 7.4 to 5.8 Ω sq −1 . After that, SSEs were fabricated by thermal vapor deposition with the guide of simulation results and theoretical analysis.…”
Section: Resultsmentioning
confidence: 99%
“…A thin film of silver is transparent and conductive simultaneously [10]. Ag ultrathin films, of 1 to 7 nm thickness showed plasmonic properties [11] This work intends to shortly present some optical effects induced by three ways, opal structures, laser polymerizing and plasmonic Ag ultra thin films.…”
Section: Introductionmentioning
confidence: 99%
“…Previously, chemical methods such as sol-gel, hydrothermal, spray pyrolysis, chemical bath deposition, and physical methods including magnetron sputtering, atomic layer deposition, and pulsed deposition have been used to make these materials. [9][10][11][12][13][14][15][16][17] Chemical methods use water or organic solvents and employ three main components: metal precursors, reducing agents, and stabilizing/capping agents for the preparation of nanosilver. The process is done under specific conditions of temperature and pressure, usually in a heated reaction chamber under vacuum, and using a surfactant to manipulate the material properties.…”
Section: Introductionmentioning
confidence: 99%