Abstract:An experimental study on selective single pulse ablation of a SiO2/Si3N4-multilayer thin film system on fused silica substrate using ultrashort pulsed laser radiation with wavelengths of 343 nm, 515 nm and 1030 nm is presented. The effect of a NiCr metal interlayer and the influence of its thickness in the range of 0.5 -3 nm on the ablation behavior are investigated. Clean delamination can be achieved in thin film systems including a metal layer. A decreasing ablation threshold with decreasing laser wavelength… Show more
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