“…Binary alloys (SiGe), tellurides, skutterudites, half-Heusler alloys, and oxide semiconductor thin films have shown dramatically improved thermoelectric performance. − Nevertheless, oxide thin films including SrTiO 3 , ZnO, In 2 O 3 , CaMnO 3 , and their heterostructures, owing to their chemical stability, high-temperature durability, and earth abundance, have been the primary choice for TFTE. − ZnO, an intrinsically n -type semiconductor, is a potential material candidate for TFTE due to the ability to tune its electrical conductivity via doping, ease of low temperature (∼400 °C) fabrication with exceptional structural quality, high optical transparency to visible light, etc. − Group III element (Al, Ga, and In) doping in ZnO is a proven strategy for the enhancement of its electrical conductivity. − Tran Nguyen et al have shown a thermopower of 88.6 μW/mK 2 for In and Ga dual-doped ZnO thin films . Pulsed laser-deposited SnO 2 /ZnO multilayer films have exhibited a thermopower of 100 μW/mK 2 with large optical transparency .…”