Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon

Bhaskaran, Harish; Gotsmann, Bernd; Sebastian, Abu; Drechsler, Ute; Lantz, Mark A.; Despont, M.; Jaroenapibal, Papot; Carpick, Robert W.; Chen, Yun; Sridharan, Kumar

doi:10.1038/nnano.2010.3

Cited by 224 publications

(196 citation statements)

References 27 publications

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“…Atomic-level wear of silica has been previously studied in experiments that combined atomic force microscopy (AFM) and transmission electron microscopy (TEM) [20]. Specifically, the authors investigated wear between a silica surface and a silicon containing diamond like carbon (DLC) tip [20].…”

Section: Introductionmentioning

confidence: 99%

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Effects of Interfacial Bonding on Friction and Wear at Silica/Silica Interfaces

Liu

Szlufarska

2014

Tribol Lett

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Static friction between amorphous silica surfaces with a varying number of interfacial siloxane (Si-O-Si) bridges was studied using molecular dynamic simulations. Static friction was found to increase linearly with the applied normal pressure, which can be explained in the framework of Prandlt-Tomlinson's model. Friction force was found to increase with concentration of siloxane bridges, but with a decreasing gradient, with the latter being due to interactions between neighboring siloxane bridges. In addition, we identified atomic-level wear mechanisms of silica. These mechanisms include both transfer of individual atoms accompanied by breaking interfacial siloxane bridges and transfer of atomic cluster initialized by rupturing of surface Si-O bonds. Our simulations showed that small clusters are continually formed and dissolved at the sliding interface, which plays an important role in wear at silica/silica interface.

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Section: Introductionmentioning

confidence: 99%

“…Specifically, the authors investigated wear between a silica surface and a silicon containing diamond like carbon (DLC) tip [20]. It was found that the classical wear law of Archard [21] fails to describe wear at the nanometer scale.…”

Section: Introductionmentioning

confidence: 99%

Effects of Interfacial Bonding on Friction and Wear at Silica/Silica Interfaces

Liu

Szlufarska

2014

Tribol Lett

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“…An alternative assumption has been made recently revealing the connection between wear and energy dissipation, in this case the friction energy is dissipated mainly in three mechanisms that correspond to three different observables: rise temperature, entropy change associated with material transformation located at the surface region and wear particles generation [8].At the nanoscale, where wear mechanisms can be studied limited to single-asperity nanoscale contacts using Scanning Probe Microscopy (SPM) family techniques [9][10][11], careful studies have theoretically predicted, [12][13][14][15], and experimentally shown, [16][17][18], that wear can occur in a smooth and gradual manner. In such experiments, the wear tests are made as follows: a probe tip scans repeatedly a small area of the surface of interest.…”

Section: Introductionmentioning

confidence: 99%

“…The decoupling of normal force from shearing force on the abrasive or adhesive-wear mechanism has also been proposed and actually waiting for an experimental validation. Single-asperity nanoscale contacts give the possibility to observe new processes dominating the occurrence of basic wear mechanisms such as atom-by-atom processes [16][17][18]. An activated-like expression has been used by Gostmann and Lantz to describe the atom-by-atom wear process generated by a conical tip during the sliding motion [16].…”

Section: Introductionmentioning

confidence: 99%

Atomic-Scale Wear in UHV: Connection Between AFM Induced-Abrasion and Debris Recrystallization

D’Acunto

2011

Tribol Lett

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Recent Ultrahigh Vacuum (UHV) scratching Atomic Force Microscopy (AFM) experiments showed the formation of regular patterns composed by small atomic clusters or mounds located around the surfaces being scanned. The formation of such structures has been theoretically reproduced and explained as, mainly produced by the flux of adatoms generated by the AFM tip stripping off adatoms during the continuous passage of the probe tip on the analysed surface. The homoepitaxy growth process on Aluminium was used for the identification of the direct connection between the adatoms flux due to wear mechanisms and the self-assembled growth processes. Such theoretical results were based on the general assumption that surface diffusion is the dominant transport mechanism of mass, and a nonequilibrium thermodynamics framework for the self-organized growth process has been developed showing evidence of the direct connection between the growth structures due to atomic debris formation and the flux of the atomic debris due to the activated wear mechanisms. In this article, we revisit the preview model giving new contributions to it and, in turn, we suggest that the improved model as proposed in this article can be supported with a new class of experiments for the quantification of the wear rates occurring for AFM probe tips in UHV conditions. In turn, a general review on activated wear mechanisms is briefly discussed.

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“…These techniques rely on specific probes to enable the transfer of materials or energy from the probe to a surface: Dip-pen nanolithography (DPN) requires tips with controlled hydrophobicitiy (1-3); anodic oxidation requires electrically conductive tips (4,5); mechanical scratching or nanografting requires rigid, wear-resistant tips (6)(7)(8); and thermal-scanning probe lithography (SPL) requires tips with integrated heaters (9). Therefore, understanding the tradeoffs inherent in using specialized SPL probes is important, especially when considering high throughput SPL techniques.…”

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confidence: 99%

Multifunctional cantilever-free scanning probe arrays coated with multilayer graphene

Shim

Brown

Zhou

et al. 2012

Proc. Natl. Acad. Sci. U.S.A.

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Scanning probe instruments have expanded beyond their traditional role as imaging or "reading" tools and are now routinely used for "writing." Although a variety of scanning probe lithography techniques are available, each one imposes different requirements on the types of probes that must be used. Additionally, throughput is a major concern for serial writing techniques, so for a scanning probe lithography technique to become widely applied, there needs to be a reasonable path toward a scalable architecture. Here, we use a multilayer graphene coating method to create multifunctional massively parallel probe arrays that have wear-resistant tips of uncompromised sharpness and high electrical and thermal conductivities. The optical transparency and mechanical flexibility of graphene allow this procedure to be used for coating exceptionally large, cantilever-free arrays that can pattern with electrochemical desorption and thermal, in addition to conventional, dip-pen nanolithography.scanning probe microscopy | tip modification | energy delivery | tip wear | friction T he ability to prepare nanoscale structures with the tip of a scanning probe has stimulated intense research efforts to use the scanning probe microscope as an instrument for nanofabrication on surfaces with high resolution, registration accuracy, and relatively low cost. These techniques rely on specific probes to enable the transfer of materials or energy from the probe to a surface: Dip-pen nanolithography (DPN) requires tips with controlled hydrophobicitiy (1-3); anodic oxidation requires electrically conductive tips (4, 5); mechanical scratching or nanografting requires rigid, wear-resistant tips (6-8); and thermal-scanning probe lithography (SPL) requires tips with integrated heaters (9). Therefore, understanding the tradeoffs inherent in using specialized SPL probes is important, especially when considering high throughput SPL techniques. A challenge common to all SPL techniques is to pattern with high throughput despite the serial nature of probe-based lithography. This has been addressed by the development of specialized systems, for example, one-(10) and two-dimensional cantilever arrays (11,12). The recent development of cantilever-free arrays provides a lowcost alternative to cantilever arrays for parallel SPL (13, 14).Recently, hard-tip, soft-spring lithography (HSL) has emerged as a technique for patterning sub-50-nm features over centimeter scales (15) by using an array of silicon tips resting on a compliant polydimethylsiloxane (PDMS) layer. These arrays are well suited for printing organic and inorganic structures in a high throughput and combinatorial fashion, but the versatility of these arrays is limited by the low electrical and thermal conductivities of PDMS. The adaptation of the cantilever-free architecture to additional SPL modalities would be powerful, but only lowtemperature processing steps that do not compromise the transparency and compliance of the PDMS layer can be considered. Considerable research has focused on improvi...

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Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon

Cited by 224 publications

References 27 publications

Effects of Interfacial Bonding on Friction and Wear at Silica/Silica Interfaces

Effects of Interfacial Bonding on Friction and Wear at Silica/Silica Interfaces

Atomic-Scale Wear in UHV: Connection Between AFM Induced-Abrasion and Debris Recrystallization

Multifunctional cantilever-free scanning probe arrays coated with multilayer graphene

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