2016
DOI: 10.1002/adma.201604427
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Ultrahigh Energy Storage Performance of Lead‐Free Oxide Multilayer Film Capacitors via Interface Engineering

Abstract: Ultrahigh energy storage density of 52.4 J cm with optimistic efficiency of 72.3% is achieved by interface engineering of epitaxial lead-free oxide multilayers at room temperature. Moreover, the excellent thermal stability of the performances provides solid basis for widespread applications of the thin film systems in modern electronic and power modules in harsh working environments.

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Cited by 267 publications
(173 citation statements)
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References 33 publications
(62 reference statements)
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“…The energy densities and efficiency of the BFSTO films are compared with those of representative lead-based and lead-free material systems reported previously, as displayed in Fig. 3c 1012,2833 . The results evidently show that the energy densities of the BFSTO films are superior to those of other reported lead-free systems (35% over the best BTO-based systems 12 ) and rival the lead-based materials.…”
Section: Resultsmentioning
confidence: 99%
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“…The energy densities and efficiency of the BFSTO films are compared with those of representative lead-based and lead-free material systems reported previously, as displayed in Fig. 3c 1012,2833 . The results evidently show that the energy densities of the BFSTO films are superior to those of other reported lead-free systems (35% over the best BTO-based systems 12 ) and rival the lead-based materials.…”
Section: Resultsmentioning
confidence: 99%
“…3c 1012,2833 . The results evidently show that the energy densities of the BFSTO films are superior to those of other reported lead-free systems (35% over the best BTO-based systems 12 ) and rival the lead-based materials. Additionally, the concomitantly achieved high efficiency makes the BFSTO films more attractive for energy storage applications.
Fig.
…”
Section: Resultsmentioning
confidence: 99%
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“…Besides, the dielectric performances of the multilayer composites could be easily tailored via designing their structures, such as number of layers, stacking sequences, and layer thickness. Wang et al [54] demonstrated that by increasing the number of Pb-free Ba 0.7 Ca 0.3 TiO 3 -BaZr 0.2 Ti 0.8 O 3 (BCT-BZT) layers, the multilayer composites exhibited improved dielectric properties at low frequency compared with BCT and BZT single layers. Wei et al [55] experimentally demonstrated that the thickness of NiFe plays significant roles in determining the dielectric properties of ZnO/NiFe/ZnO heterojunction films, and the most optimal characteristics could be obtained when the thickness of inserted NiFe layer is 30 nm.…”
Section: Introductionmentioning
confidence: 99%