Micc 90 1991
DOI: 10.1007/978-94-011-3676-1_14
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Ultrafine Powders of the Refractory Materials in the Composite Development

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“…Silicon nitride (Si 3 N 4 ), titanium nitride (TiN), and alumina (Al 2 O 3 ) powders prepared by plasma chemical synthesis of mean size ≤ 0.03 µm were used as initial powders [37,38]. As received, these powders were electrostatically charged and could shift under the effect of a magnetic field.…”
Section: Methodsmentioning
confidence: 99%
“…Silicon nitride (Si 3 N 4 ), titanium nitride (TiN), and alumina (Al 2 O 3 ) powders prepared by plasma chemical synthesis of mean size ≤ 0.03 µm were used as initial powders [37,38]. As received, these powders were electrostatically charged and could shift under the effect of a magnetic field.…”
Section: Methodsmentioning
confidence: 99%