Ultrafine Particle Removal Using Gas Cluster Ion Beam Technology

Molecular dynamics simulations study of nano particle migration by cluster impact

“…Additionally, the mass of the NP atom is defined as 12 amu. From these definitions, the bulk properties of the NP are  density: 1.5 g/cm 3  structure: fcc  Young's Modulus: 260 GPa.…”

“…On the other hand, the demand for efficient surface cleaning with a dry process arises from the cleaning of semiconductor wafers with a mask structure kept on the surface. Dobashi [3] and his group reported that ultrafine particles are removed without damage on the wafer surface or pattern structure by utilizing a CO2 GCIB at several tens of keV of incident energy.…”

Particle and pattern discriminant freeze-cleaning method

“…Various processes (e.g., dry cleaning) with respect to cleaning have been investigated. [8][9][10] Cleaning technologies based on liquids have also been employed given that physical forces are effective in particle removal. Accordingly, their use is expected to increase over time.…”