Ultrafast fabrication of high-aspect-ratio macropores in P-type silicon: toward the mass production of microdevices

Ge, Daohan; Wen-bing, LI; Lu, Le Trong; Wei, Jinxiu; Huang, Xing; Zhang, Liqiang; Reece, Peter J.; Zhu, Shunming; Gooding, J. Justin

doi:10.1080/21663831.2018.1527788

Cited by 13 publications

(4 citation statements)

References 26 publications

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“…The development of MEMS is essential for the manufacture of highly sensitive inertial sensors, micro-capacitors, accelerometers, gyroscopes, micro-optical elements, etc 2 – 6 . The key step in the production and development of modern MEMS is the precision of the pattern transfer to a silicon substrate, with the creation of vertical structures with a high aspect ratio 7 – 10 . The main approach to achieve this goal is to have the surface reaction occur only in the vertical direction 11 .The importance of obtaining structures with a high aspect ratio is due to the need to integrate an increasing number of individual microdevices into one complex microsystem to perform a variety of functions.…”

Section: Introductionmentioning

confidence: 99%

OES diagnostics as a universal technique to control the Si etching structures profile in ICP

Осипов

Iankevich

Speshilova

et al. 2022

Sci Rep

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In this work, we demonstrate the high efficiency of optical emission spectroscopy to estimate the etching profile of silicon structures in SF6/C4F8/O2 plasma. The etching profile is evaluated as a ratio of the emission intensity of the oxygen line (778.1 nm) to the fluorine lines (685.8 nm and 703.9 nm). It was found that for the creation of directional structures with line sizes from 13 to 100 μm and aspect ratio from ≈ 0.15 to ≈ 5 the optimal intensities ratio is in the range of 2–6, and for structures from 400 to 4000 μm with aspect ratio from ≈ 0.03 to ≈ 0.37 it is in the range 1.5–2. Moreover, the influence of the process parameters on the etching rate of silicon, the etching rate of aluminum, the inclination angle of the profile wall of the etched window, the selectivity of silicon etching with respect to aluminum, and the influence on the overetching (Bowing effect) of the structure was investigated.

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Section: Introductionmentioning

confidence: 99%

OES diagnostics as a universal technique to control the Si etching structures profile in ICP

Осипов

Iankevich

Speshilova

et al. 2022

Sci Rep

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“…Due to its visible light luminescence of Psi and strong light emission in the near-infrared and visible light regions, , Psi has attracted great attention. Moreover, PSi has a large number of favorable properties, such as the extremely large surface area, good size-exclusion effect, and tunable optical properties, − which make it an attractive and suitable material for biosensing applications. , …”

Section: Introductionmentioning

confidence: 99%

Silver Nano-Dendrite-Plated Porous Silicon Substrates Formed by Single-Step Electrochemical Synthesis for Surface-Enhanced Raman Scattering

Wei

Ding

et al. 2020

ACS Appl. Nano Mater.

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Nanostructured layers composed of porous silicon (PSi)-based silver (Ag) nanodendrites have been formed by a simple single-step electrochemical anodic oxidation process on p-type silicon substrate. A mixture of hydrofluoric acid (HF), silver nitrate (AgNO 3 ), and dimethylformamide (DMF) solution was used as the electrolyte to form PSi and nanoscaled Ag structures simultaneously in a few minutes without any post treatment. We studied the influence of the anodization parameters on the morphologies of Ag-PSi structures. The results show that the metallic Ag attached to PSi surfaces completed the conversion from nanoparticles to nanodendrites with the increase of AgNO 3 concentrations, along with the increase of the number, size, and the area they covered of dendrites. The sensitivity and stability of the Ag dendrites-coated PSi substrate were evaluated using Rhodamine 6G (R6G) as probe molecule. This Ag-PSi substrate exhibits high surface-enhanced Raman scattering (SERS) response, good reproducibility, and outstanding long-time stability with a detection limit of R6G as low as 10 −11 M. This single-step systhesis technique provides a simple method for preparation of SERS-active substrates with high sensitivity and stability, representing a promising SERS platform for chemical and biomolecule detections.

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“…In the past few decades, several methods were created for detecting rice blast. In the early years, manual observation with a microscope was used to detect rice blast . Later came the hyperspectral detection method and the morphological image detection method .…”

Section: Introductionmentioning

confidence: 99%

“…In the early years, manual observation with a microscope was used to detect rice blast. 22 Later came the hyperspectral detection method 23 and the morphological image detection method. 24 Nevertheless, these methods detect lesions on the surface of rice, and these are easy to confuse with other diseases, and so the accuracy may not be high enough.…”

Section: Introductionmentioning

confidence: 99%

A rapid rice blast detection and identification method based on crop disease spores' diffraction fingerprint texture

Yang

Wang

et al. 2020

J Sci Food Agric

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BACKGROUND Rice blast fungus is a worldwide disease, and it is one of the most serious rice diseases in the north and south rice fields in China. The initial symptoms of rice blast are not obvious, and the speed of transmission is fast. Manual identification is time‐consuming and laborious. At present, it is a great challenge to realize rapid and accurate early identification of rice blast. RESULTS In this paper, an identification method based on crop disease spores' diffraction fingerprint texture for rice blast was studied; this method utilizes the light field and texture features of diffraction images. To verify the reliability of the model that we proposed, we selected two methods of manual identification and machine recognition to compare and detect rice blast spores. The experimental results show that the identification of light diffraction characteristics is not only higher than the traditional manual recognition by microscope (increased by more than 0.3%), but also faster after neural network training (increased by more than 90%). The diffraction recognition method used in this study, based on crop disease spores' diffraction fingerprint texture, can be completed in a few seconds, and its test accuracy is 97.18%. CONCLUSION The proposed method, a rapid rice blast detection and identification method based on crop disease spores' diffraction fingerprint texture, has certain advantages compared with the existing manual identification by microscope. This method can be applied to the recognition of rice blast in agricultural research. © 2020 Society of Chemical Industry

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Ultrafast fabrication of high-aspect-ratio macropores in P-type silicon: toward the mass production of microdevices

Cited by 13 publications

References 26 publications

OES diagnostics as a universal technique to control the Si etching structures profile in ICP

OES diagnostics as a universal technique to control the Si etching structures profile in ICP

Silver Nano-Dendrite-Plated Porous Silicon Substrates Formed by Single-Step Electrochemical Synthesis for Surface-Enhanced Raman Scattering

A rapid rice blast detection and identification method based on crop disease spores' diffraction fingerprint texture

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