Ultrafast Damage Dynamics and Ablation Mechanism of Gase Induced by Femtosecond Laser Irradiation

Unidirectional growth of epitaxial tantalum disulfide triangle crystals grown on sapphire by chemical vapour deposition with a separate-flow system

“…The dew point of the TaCl 5 line upstream was measured and kept at lower than −60 °C to prevent the chloride source from oxidizing. Notably, our APCVD system had the following features that differed from the conventional single-flow CVD 14,16,[38][39][40] to improve controllability and reproducibility.…”

“…Although mechanical exfoliation is still used for the fundamental study of two-dimensional materials, [1][2][3] chemical vapour deposition (CVD) is one of the most reliable and scalable methods to synthesize two-dimensional transition metal dichalcogenides (TMDCs). [4][5][6][7][8][9][10][11][12][13][14][15][16][17] Molybdenum dichalcogenides (MoX 2 ) 5,[7][8][9][10]12,13,18 and tungsten dichalcogenides (WX 2 ) 4,6,19 of the TMDCs have been most extensively studied in the past decade due to the existence of a volatile oxide precursor. The high volatility of the oxide precursor can simplify CVD apparatus to synthesize epitaxially grown thin films of MoX 2 and WX 2 , even a monolayer because oxide impurities are automatically eliminated from the product.…”