Nonlinear Optics: Materials, Fundamentals and Applications 2007
DOI: 10.1364/nlo.2007.mb4
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Ultrafast Carrier Dynamics in Semiconductor Nanowires

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Cited by 12 publications
(28 citation statements)
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“…By tuning the probe photon energy through the MoS 2 band gap (both indirect and direct), our UOM measurements show that conduction and valence band states are rapidly populated on a sub-picosecond (ps) time scale in a MoS 2 monolayer after photoexcitation at 3.1 eV, consistent with previous work [14][15][16][17][18] . Pump fluence-dependent measurements reveal that subsequent carrier relaxation in our samples is primarily due to surface-related defects and trap states, not the Auger processes observed in previous measurements on MoS 2 and other semiconductor nanosystems 12,[18][19][20][21][22][23] . We also observed an increase in the carrier relaxation time with an increase in the number of MoS 2 layers, likely due to the well known layer-dependent changes in the electronic structure 16,24 .…”
mentioning
confidence: 40%
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“…By tuning the probe photon energy through the MoS 2 band gap (both indirect and direct), our UOM measurements show that conduction and valence band states are rapidly populated on a sub-picosecond (ps) time scale in a MoS 2 monolayer after photoexcitation at 3.1 eV, consistent with previous work [14][15][16][17][18] . Pump fluence-dependent measurements reveal that subsequent carrier relaxation in our samples is primarily due to surface-related defects and trap states, not the Auger processes observed in previous measurements on MoS 2 and other semiconductor nanosystems 12,[18][19][20][21][22][23] . We also observed an increase in the carrier relaxation time with an increase in the number of MoS 2 layers, likely due to the well known layer-dependent changes in the electronic structure 16,24 .…”
mentioning
confidence: 40%
“…3(b), which shows that τ increases by a factor of two and the maximum value of Δ T/T increases by more than a factor of three over the measured fluence range, saturating at the highest fluences (likely due to state filling near the band edge). This dependence of τ on F is the opposite of what one would expect for interband Auger recombination, a three-carrier non-radiative process that often dominates carrier relaxation at high fluence in semiconductor nanostructures [19][20][21][22][23]27 . This is also inconsistent with Auger-induced capture into defect states, as described in refs.…”
Section: Resultsmentioning
confidence: 77%
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“…Transmission electron microscopy showed the nanowires are singlecrystalline, free of threading dislocations, and have triangular cross-sections. The high degree of vertical alignment is most likely the result of the crystallographic match between the [11][12][13][14][15][16][17][18][19][20] oriented nanowires and the r-plane sapphire surface. Uniform, dense, aligned growth could be achieved over wafer-scale areas by controlling the Ni thickness and growth conditions precisely, as shown in Figure 1.…”
Section: Highly Aligned Template-free Gan Nanowire Growthmentioning
confidence: 99%