Ultra-smooth surface with 0.4 Å roughness on fused silica

Tan, Zhongqi; Jiang, Xiaowei; Mao, Yuanhao; Long, Xingwu; Luo, Hui

doi:10.1016/j.ceramint.2022.08.022

Cited by 11 publications

(1 citation statement)

References 32 publications

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“…For the first time, the origin of submicron flaws on the surface of fused silica was investigated based on the agglomeration strength of secondary CeO 2 particles, providing a foundation for the prediction of the quantity of surface defects. Z. Tan et al used various physical and chemical techniques to further reduce the size of polishing particles, improving the polishing liquid performance and consistently producing an ultra-smooth surface with roughness of 0.4 Å on fused silica [40]. Importantly, the experiment demonstrated that the densification process resulting from the longitudinal pressure in the polishing process enhanced the surface uniformity and promoted the creation of ultra-smooth surfaces.…”

Section: Chemical Mechanical Polishingmentioning

confidence: 99%

A Review of Emerging Technologies in Ultra-Smooth Surface Processing for Optical Components

Li,

Xin,

Fan

et al. 2024

Micromachines

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Advancements in astronomical telescopes and cutting-edge technologies, including deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography, have escalated demands and imposed stringent surface quality requirements on optical system components. Achieving near-ideal optical components requires ultra-smooth surfaces with sub-nanometer roughness, no sub-surface damage, minimal surface defects, low residual stresses, and intact lattice integrity. This necessity has driven the rapid development and diversification of ultra-smooth surface fabrication technologies. This paper summarizes recent advances in ultra-smooth surface processing technologies, categorized by their material removal mechanisms. A subsequent comparative analysis evaluates the roughness and polishing characteristics of ultra-smooth surfaces processed on various materials, including fused silica, monocrystalline silicon, silicon carbide, and sapphire. To maximize each process’s advantages and achieve higher-quality surfaces, the paper discusses tailored processing methods and iterations for different materials. Finally, the paper anticipates future development trends in response to current challenges in ultra-smooth surface processing technology, providing a systematic reference for the study of the production of large-sized freeform surfaces.

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Section: Chemical Mechanical Polishingmentioning

confidence: 99%