2011
DOI: 10.4028/www.scientific.net/kem.487.283
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Ultra Smooth Polishing Research Based on the Cluster Magnetorheological Effect

Abstract: Based on the principle of MR polishing processing, cluster MR-effect polishing method which formed by cluster distributed magnetic body has been put forward in this article. The author analyzed the principle of the cluster MR-effect plane polishing, developed experimental device and conducted processing experiment to K9 optical glass and silicon slice. Results show that the method is feasible and can realize high precision polishing. The surface roughness of K9 glass and silicon slice can achieve respectively … Show more

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Cited by 5 publications
(3 citation statements)
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“…Hu et al [ 61 ] proposed a form of MRF process based on permanent magnetic yoke excitation for achieving a high-quality surface finish on flat zirconia ceramics (40 mm × 40 mm × 1.1 mm) using MR fluid, which is the mixture of CI particles, abrasives, an additive agent and deionized water. Clustered magnetorheological finishing (CMRF) is a novel finishing process which can be used to achieve a fine surface finish on various materials, including silicon nitride ceramics [ 62 ], glass [ 63 ], and crystal silicon substrates [ 64 ]. The CMRF process is feasible for reducing the surface roughness to the nanometer range (2.69–9 nm) [ 64 ].…”
Section: Introductionmentioning
confidence: 99%
“…Hu et al [ 61 ] proposed a form of MRF process based on permanent magnetic yoke excitation for achieving a high-quality surface finish on flat zirconia ceramics (40 mm × 40 mm × 1.1 mm) using MR fluid, which is the mixture of CI particles, abrasives, an additive agent and deionized water. Clustered magnetorheological finishing (CMRF) is a novel finishing process which can be used to achieve a fine surface finish on various materials, including silicon nitride ceramics [ 62 ], glass [ 63 ], and crystal silicon substrates [ 64 ]. The CMRF process is feasible for reducing the surface roughness to the nanometer range (2.69–9 nm) [ 64 ].…”
Section: Introductionmentioning
confidence: 99%
“…The abrasives with different sizes aggregate on the top of MR pad are all equally effective in removing the material while interacting with the machined surface. A large region planarization and smooth surface can be achieved with this method, and a large number optimization study was carried out for difference materials [18,19] Fig. 1, the principle of cluster MR plane polishing is illustrated.…”
Section: Introductionmentioning
confidence: 99%
“…Magnetorheological finishing (MRF) is a computer-controlled and flexible finishing technique that is commonly used in the production of high-quality optical components [4]. It is learned from the literature that high-quality machined surfaces of optical glass, silicon and aluminum nitride ceramic substrate after lapping and polishing with the cluster MR-effect polishing tool have been obtained [5,6]. Therefore , an advanced nano-finishing of constraining abrasives by the cluster MR-effect plate is presented to lap and polish high temperature sintering formed SrTiO 3 substrate and expect to obtain an ultra-smooth and non-damage surface in this paper.…”
Section: Introductionmentioning
confidence: 99%