2010
DOI: 10.1063/1.3463360
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Ultra-high Resolution Optics for EUV and Soft X-ray Inelastic Scattering

Abstract: Abstract. We describe a revolutionary new approach to high spectral resolution soft x-ray optics. Conventionally in the soft x-ray energy range, high spectral resolution is obtained by use of a relatively low line density grating operated in 1 st order with small slits. This severely limits throughput. This limitation can be removed by use of a grating either in very high order, or with very high line density, if one can maintain high diffraction efficiency. We have developed a new technology for achieving bot… Show more

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Cited by 5 publications
(5 citation statements)
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“…The main technological challenges are fabrication of nano-period saw-tooth substrates with a perfect groove profile and an atomically smooth surface of blazed facets, and deposition of a multilayer (ML) on the highly corrugated surface of the substrates. Recent progress in fabrication of saw-tooth gratings with anisotropic etching of silicon single crystals [4,5] provided the necessary quality of the substrates [6]. The main remaining problem however is coherent replication of this structure from the substrate throughout the whole multilayer stack.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…The main technological challenges are fabrication of nano-period saw-tooth substrates with a perfect groove profile and an atomically smooth surface of blazed facets, and deposition of a multilayer (ML) on the highly corrugated surface of the substrates. Recent progress in fabrication of saw-tooth gratings with anisotropic etching of silicon single crystals [4,5] provided the necessary quality of the substrates [6]. The main remaining problem however is coherent replication of this structure from the substrate throughout the whole multilayer stack.…”
mentioning
confidence: 99%
“…Anisotropic etching of the silicon followed by isotropic chemical etch was used to produce triangular grooves in the saw-tooth substrates with the blaze angle of 2º. The details of the etch process can be found elsewhere [6].…”
mentioning
confidence: 99%
“…Evolution of the Mo/Si stack structure during the ML growth onto the 200 nm saw-tooth substrate were discussed earlier [9].…”
Section: Resultsmentioning
confidence: 99%
“…Fabrication of the grating #1 with the period of 200 nm used scanning beam interference lithography [7], and the 100 nm period pattern for the grating #2 was produced with e-beam lithography. The micro-fabrication process described earlier [8] was applied to the wafers to form a saw-tooth profile of the substrates.…”
Section: Methodsmentioning
confidence: 99%
“…Ранее подобное исследование никем не проводилось, а допустимое значение среднеквадратичного отклонения (СКО) шероховатости отражающей поверхности σ , как правило, оценивалось как σ ≪ λ/6 cos θ [4], где λдлина волны падающего излучения, θ -угол падения, отсчитанный от нормали. Для применений в ЭУФ считается приемлемым σ поверхности решетки ∼ 0.5−1 nm [5], a для МР диапазона ∼ 0.3−0.4 nm [6]. Исследование влияния формы профиля штрихов и шероховатости поверхности отражающей грани на отток дифракционной эффективности из рабочего порядка проводилось для Si-решеток с углом блеска 1−4…”
Section: Introductionunclassified