2015
DOI: 10.1016/j.jcis.2015.01.047
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Ultra-high ordered, centimeter scale preparation of microsphere Langmuir films

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Cited by 12 publications
(5 citation statements)
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References 53 publications
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“…However, the preference lies in colloidal materials that: (1) can be synthesized with precise monodispersed particle sizes; (2) allow highly-selective etching (RIE) in step b) of Figure 2 ; and (3) can be easily removed by chemical lift-off in step d) [ 54 , 57 , 58 , 59 , 60 , 61 , 62 , 63 , 64 ]. In view of that, the most synthesized particle materials for use in CL have been polystyrene (PS), polymethyl methacrylate (PMMA), and silica [ 65 ]. Good phase stability, together with a narrow colloidal size distribution (less than 5% for the typically employed microspheres), has been achieved by suspension [ 40 ], emulsion [ 66 ], and dispersion polymerization [ 64 , 67 ] synthesis techniques.…”
Section: Colloidal Lithography (Cl) Methodologiesmentioning
confidence: 99%
See 1 more Smart Citation
“…However, the preference lies in colloidal materials that: (1) can be synthesized with precise monodispersed particle sizes; (2) allow highly-selective etching (RIE) in step b) of Figure 2 ; and (3) can be easily removed by chemical lift-off in step d) [ 54 , 57 , 58 , 59 , 60 , 61 , 62 , 63 , 64 ]. In view of that, the most synthesized particle materials for use in CL have been polystyrene (PS), polymethyl methacrylate (PMMA), and silica [ 65 ]. Good phase stability, together with a narrow colloidal size distribution (less than 5% for the typically employed microspheres), has been achieved by suspension [ 40 ], emulsion [ 66 ], and dispersion polymerization [ 64 , 67 ] synthesis techniques.…”
Section: Colloidal Lithography (Cl) Methodologiesmentioning
confidence: 99%
“…Still, using the simpler CL version with close-packed 2D colloidal crystals as etching masks, triangular nanoparticles [ 105 ], nanodots [ 106 ], and thin-films with nanohole arrays [ 107 ], nanotips [ 108 ], or nanopillars [ 109 ] have been fabricated on several substrates (such as polymer-based, silica, and silicon) [ 65 , 69 , 97 ].…”
Section: Colloidal Lithography (Cl) Methodologiesmentioning
confidence: 99%
“…On the basis of this classical process, the LB principle has been adapted for microsphere colloidal lithography. The role of the classical amphiphilic molecules is played by microspheres of polystyrene functionalized with a steric acid group, e.g., C18-triethoxy (octadecyl) silane [22]. Here, the colloidal lithography experiments are performed using P-spheres with diameters of 2 and 3 µm, commercially available at Microparticles GmbH ® and Micro Partikeltechnologie GmbH ® .…”
Section: Methodsmentioning
confidence: 99%
“…A key aspect, in common with so-called colloidal lithography, is the preparation of self-assembled arrays of spheres [113], that is a material science topic attracting special attention. In this context, the Langmuir-Blodgett technique is a widely applied method due to its ability to prepare large-scale high-quality self-assembled monolayers, provided that the spheres and/or the surface are appropriately functionalized [114]. Figure 6a shows, by atomic force microscopy (AFM), the hexagonal periodic arrangement of functionalized spheres (1 µm diameter) as obtained by this method.…”
Section: Microsphere-assisted Sub-diffraction Laser Processingmentioning
confidence: 99%