2022
DOI: 10.1088/1361-6528/ac76d4
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Ultimate low leakage and EOT of high-κ dielectric using transferred metal electrode

Abstract: The increase of gate leakage current when the gate dielectric layer is thinned is a key issue for device scalability. For scaling down the integrated circuits, a thin gate dielectric layer with a low leakage current is essential. Currently, changing the dielectric layer material or enhancing the surface contact between the gate dielectric and the channel material is the most common way to reduce gate leakage current in devices. Herein, we report a technique of enhancing the surface contact between the gate die… Show more

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