Two-photon polymerization lithography for imaging optics

Abstract

Optical imaging systems have greatly extended human visual capabilities, enabling the observation and understanding of diverse phenomena. Imaging technologies span a broad spectrum of wavelengths from X-ray to radio frequencies and impact research activities and our daily lives. Traditional glass lenses are fabricated through a series of complex processes, while polymers offer versatility and ease of production. However, modern applications often require complex lens assemblies, driving the need for miniaturization and advanced designs with micro- and nanoscale features to surpass the capabilities of traditional fabrication methods. Three-dimensional (3D) printing, or additive manufacturing, presents a solution to these challenges with benefits of rapid prototyping, customized geometries, and efficient production, particularly suited for miniaturized optical imaging devices. Various 3D printing methods have demonstrated advantages over traditional counterparts, yet challenges remain in achieving nanoscale resolutions. Two-photon polymerization lithography (TPL), a nanoscale 3D printing technique, enables the fabrication of intricate structures beyond the optical diffraction limit via the nonlinear process of two-photon absorption within liquid resin. It offers unprecedented abilities, e.g., alignment-free fabrication, micro- and nanoscale capabilities, and rapid prototyping of almost arbitrary complex 3D nanostructures. In this review, we emphasize the importance of the criteria for optical performance evaluation of imaging devices, discuss material properties relevant to TPL, fabrication techniques, and highlight the application of TPL in optical imaging. As the first panoramic review on this topic, it will equip researchers with foundational knowledge and recent advancements of TPL for imaging optics, promoting a deeper understanding of the field. By leveraging on its high-resolution capability, extensive material range, and true 3D processing, alongside advances in materials, fabrication, and design, we envisage disruptive solutions to current challenges and a promising incorporation of TPL in future optical imaging applications.

Large-aperture imaging system based on 100 mm all-Si metalens in long-wave infrared

“…In addition, the MTF curve shown in figure 2(d) is obtained via a fast Fourier transform of the intensity distribution of focal plane [19]. Compared to the diffraction-limited MTF, the actual MTF exhibits attenuation and fluctuation, which is mainly caused by aberration and diffraction [20,21].…”