1980
DOI: 10.1088/0022-3727/13/8/026
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Two-phase mechanism of laser-induced removal of thin absorbing films. I. Theory

Abstract: A physical model of laser-induced removal of thin absorbing films is proposed. The qualitative concepts of melt surface evaporation and of melt motion under the action of the reactive vapour pressure, of surface tension forces and of adhesion, support the model. The basic equations describing the removal process are solved numerically. An analytical parameter phi , characterising the relationship between the liquid and vapour phases of the removed material, is obtained. It is shown that, depending on the direc… Show more

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Cited by 50 publications
(15 citation statements)
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“…Once the plasma plume starts to (c) interface of decoated and coated sample decay, a clear sight of the particle ejection from the laser-irradiated surface was observed, as shown inside the circles in Figs 12(b)-(d). The combined effects thus served as a clear evidence of the partial coating vaporization and subsequent liquid metal expulsion, which is in agreement with reference [30]. The particles seemed to be the melted particles ejected from the irradiated spot by the vapour pressure created in the irradiated zone.…”
Section: Discussion On Removal Mechanismsupporting
confidence: 88%
“…Once the plasma plume starts to (c) interface of decoated and coated sample decay, a clear sight of the particle ejection from the laser-irradiated surface was observed, as shown inside the circles in Figs 12(b)-(d). The combined effects thus served as a clear evidence of the partial coating vaporization and subsequent liquid metal expulsion, which is in agreement with reference [30]. The particles seemed to be the melted particles ejected from the irradiated spot by the vapour pressure created in the irradiated zone.…”
Section: Discussion On Removal Mechanismsupporting
confidence: 88%
“…The melt duration induced by laser melting of metal films on a substrate can last much longer than the pulse duration and has been measured on the order of 100's of nanoseconds for chromium films [10] to microseconds for gold films [9]. Expulsion of liquid from the molten pool may result from flow induced by surface-tension gradients, vapor recoil pressure, and explosive phase change [8][9][10][11][12][13][14], as shown in Fig. 1.…”
Section: Introductionmentioning
confidence: 99%
“…* Solid phase explosive removal, caused by a gas pressure build-up at film-substrate interface as a result from substrate vaporization or by thermal-induced stresses. * Two-phase removal, which was characterized by partial vaporization and subsequent liquid expulsion [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%