2013
DOI: 10.1063/1.4812563
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Two-dimensional to three-dimensional tunneling in InAs/AlSb/GaSb quantum well heterojunctions

Abstract: We examine room temperature band-to-band tunneling in 2D InAs/3D GaSb heterostructures. Specifically, multi-subband, gate-controlled negative differential resistance is observed in InAs/ AlSb/GaSb junctions. Due to spatial confinement in the 10 nm-thick InAs layer, tunneling contributions from two distinct subbands are observed as sharp steps in the current-voltage characteristics. It is shown that the relative position of the steps can be controlled via external gate bias. Additionally, the extracted separati… Show more

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Cited by 18 publications
(16 citation statements)
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“…Another advantage of two dimensional transition metal dichalcogenides is that they can be promising materials for developing BTBT transistors, which enable steeper subthreshold swing and the down scaling of the supply voltage beyond the fundamental thermionic limit [30,31]. As a significant step toward this direction, we have experimentally demonstrated the operation of a backward diode in a WSe 2 :Nb/WSe 2 :Re vertical heterojunction as schematically shown in the top inset of Fig.…”
Section: Demonstration Of Band To Band Tunnelingmentioning
confidence: 99%
“…Another advantage of two dimensional transition metal dichalcogenides is that they can be promising materials for developing BTBT transistors, which enable steeper subthreshold swing and the down scaling of the supply voltage beyond the fundamental thermionic limit [30,31]. As a significant step toward this direction, we have experimentally demonstrated the operation of a backward diode in a WSe 2 :Nb/WSe 2 :Re vertical heterojunction as schematically shown in the top inset of Fig.…”
Section: Demonstration Of Band To Band Tunnelingmentioning
confidence: 99%
“…The biased DB is a simple system and the resonant tunneling and negative resistance behavior have been amply and extensively studied, and little or nothing should be added after 50 years of research and applications. However, it turns out that a feature in the negative resistance domain, that appeared in numerous experimental reports, [196,[212][213][214][215][216][217][218][219][220][221][222] has not been well understood, much less predicted. That feature is a shoulder as the one seen, between 0.32 and 0.43 V, in the experimental (black, continuous) curve in Figure 18b) reported by Bowen et al in ref.…”
Section: Multichannel Features In the Negative Resistance Domain Of B...mentioning
confidence: 99%
“…After the drain metal deposition step, a ∼100 nm thick layer of HSQ resist was spun, exposed by electron beam and developed with MF319. Afterward, the mesa junction etch step was performed with wet-etching, as detailed in [21], to form the structure shown in Fig. 1(e).…”
Section: B Nanofabrication Of Overlap and Underlap Gate Devicesmentioning
confidence: 99%
“…It clearly shows a gate-controlled negative differential resistance behavior, confirming an inter-band tunneling operation. The double peak re- sults from the subbands of the quantized InAs layer, which is sandwiched between the ZrO 2 gate oxide layer and the wideband gap AlSb layer [21]. Performance comparison of published III-V TFETs is shown in Table I (see Refs. [6], [8]- [11], [17], [19], [25], [26]).…”
Section: Electrical Characterization Of Overlap Gate Devicementioning
confidence: 99%