1995
DOI: 10.1109/27.467977
|View full text |Cite
|
Sign up to set email alerts
|

Two-dimensional simulation of polysilicon etching with chlorine in a high density plasma reactor

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

2
56
1

Year Published

1997
1997
2018
2018

Publication Types

Select...
7
2
1

Relationship

0
10

Authors

Journals

citations
Cited by 71 publications
(60 citation statements)
references
References 11 publications
2
56
1
Order By: Relevance
“…They concluded that the effects of the gas flow on the global plasma parameters were secondary for low pressure systems. The Modular Plasma Reactor Simulator code of Lymberopoulos and Economou 22 recognized the importance of gas-plasma coupling but only included mass conservation for the neutrals, neglecting momentum and energy conservation. The convective term V .…”
Section: Introductionmentioning
confidence: 99%
“…They concluded that the effects of the gas flow on the global plasma parameters were secondary for low pressure systems. The Modular Plasma Reactor Simulator code of Lymberopoulos and Economou 22 recognized the importance of gas-plasma coupling but only included mass conservation for the neutrals, neglecting momentum and energy conservation. The convective term V .…”
Section: Introductionmentioning
confidence: 99%
“…In addition, one could neglect the crossderivative entries, such that the ow eld and the electric eld are updated in a decoupled manner, as was done for the Picard method. The following approximate Newton method is thus obtained: (25) where no approximations have been used in the residual expression R n Q . The approximate JacobianJ n Q is given bỹ…”
Section: Approximate Newton Methodsmentioning
confidence: 99%
“…[3] [4] In these equations the subscript s denotes all ns species including electrons (s ϭ e), ions (s ϭ i), and all neutral species. The subscript r sums over all nr gas-phase chemical reactions.…”
Section: Modelmentioning
confidence: 99%