2004
DOI: 10.1016/j.sse.2003.12.019
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Two-dimensional simulation of pattern-dependent oxidation of silicon nanostructures on silicon-on-insulator substrates

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Cited by 63 publications
(65 citation statements)
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“…[22] The presence of a concave curvature as in macroporous Si results in a pronounced retardation of the oxide growth with respect to planar oxidation. [21,[23][24][25][26][27] Kao et al attributed this phenomenon to viscous stress in the oxide layers associated with nonuniform mechanical deformation. [24] Whereas in planar systems only stress components parallel to the Si/SiO 2 interface exist in the newly formed SiO 2 layer, stress normal to the Si/SiO 2 interface also occurs in concave systems.…”
Section: Resultsmentioning
confidence: 99%
“…[22] The presence of a concave curvature as in macroporous Si results in a pronounced retardation of the oxide growth with respect to planar oxidation. [21,[23][24][25][26][27] Kao et al attributed this phenomenon to viscous stress in the oxide layers associated with nonuniform mechanical deformation. [24] Whereas in planar systems only stress components parallel to the Si/SiO 2 interface exist in the newly formed SiO 2 layer, stress normal to the Si/SiO 2 interface also occurs in concave systems.…”
Section: Resultsmentioning
confidence: 99%
“…Because the geometrical shape at the bottom of the pits hinders the volumetric expansion, it imposes additional stress to the region. The stress leads to an apparent increase in the energy barrier to oxidation locally and thus a slowing down of the oxidation rate near the tip of individual Si pits [20]- [23]. Fig.…”
Section: Resultsmentioning
confidence: 99%
“…At a high oxidation temperature of 875°C, wires were found to be relaxed (Table I) oxide at a relatively lower temperature as compared with SiNWs. In the literature, 6,8,19 it was reported that SiNW formation was mainly due to stress limiting oxidation and oxide viscosity when oxidation was carried out at higher temperatures. In the present study, the role of stress limiting oxidation is not prominent in SiGe nanowire formation owing to the enrichment of Ge (35-94%) from all directions.…”
Section: Resultsmentioning
confidence: 99%
“…1,2 Si nanowires (SiNWs) are being synthesized and fabricated by various growth methods and top-down approaches. [3][4][5][6] However, the top-down approach for the fabrication of Si nanostructures is favorable, being a complementary metal-oxide-semiconductor (CMOS)-compatible technology. 7 Recently, SiNWs or SiGe nanowires (SGNWs) with circular, square, and triangular shapes have been fabricated by the top-down approach.…”
Section: Introductionmentioning
confidence: 99%