2014
DOI: 10.1088/1742-6596/491/1/012003
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Two dimensional Si layer epitaxied on LaAlO3(111) substrate: RHEED and XPS investigations

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Cited by 11 publications
(5 citation statements)
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“…[ 171 ] The Si grows in nanoislands form on (100) face of LAO [ 172 ] and was examined by RHEED and XPS analysis. [ 173 ] In RHEED patterns presence of Kikuchi lines throughout growth shows that surface maintain its flat architecture. The integral lines persistence shows configuration of the Si 2D layer at 300 and 500 °C.…”
Section: Group Iva 2d Xenes Family Synthesis Methodsmentioning
confidence: 99%
“…[ 171 ] The Si grows in nanoislands form on (100) face of LAO [ 172 ] and was examined by RHEED and XPS analysis. [ 173 ] In RHEED patterns presence of Kikuchi lines throughout growth shows that surface maintain its flat architecture. The integral lines persistence shows configuration of the Si 2D layer at 300 and 500 °C.…”
Section: Group Iva 2d Xenes Family Synthesis Methodsmentioning
confidence: 99%
“…Here, ML denotes the ideal atomic density in a Si (111) plane, i.e. 7.8 × 10 14 atom cm -2 [54]. It is not common to express the deposition rate as atom/time in experiments.…”
Section: Defect Assessmentmentioning
confidence: 99%
“…102 A promising study on epitaxial growth of Si on LAO substrates is reported in Ref. 103, where a single layer of Si is deposited via MBE onto a LAO( 111)-(2ͱ3 Â 2ͱ3)R30 reconstructed surface. The growth experiments were performed at different substrate temperatures (i.e., 300 C and 500 C) and followed using the RHEED technique.…”
Section: Laalomentioning
confidence: 99%