Two-dimensional arrays self-assembled<i>via</i>interference of concentration modulation waves in drying solutions

Li, Shunpu; Chun, Young Tea; Jin, Li; Shrestha, Pawan Kumar; Ahn, Hyungju; Ahn, Docheon; Sohn, Jung Inn; Hong, Woong-Ki; Kim, Bongjun; Deng, Yuanbo; Chu, Daping

doi:10.1039/c8mh01264d

Cited by 3 publications

(3 citation statements)

References 37 publications

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“…where G'' is the second derivative of the free energy of solution system with respect to composition, and k is the 'square gradient' parameter. By taking k~0.05-0.4 (Å 2 molcm -3 ) and -G''~10 -7 -10 -5 (molcm -3 ), 36,37 one can estimate sn ~0.1-3 m, which agrees with our experiment.…”

Section: Pattern Formation Mechanism and Simulationssupporting

confidence: 89%

Turing patterns with high-resolution formed without chemical reaction in thin-film solution of organic semiconductors

Xiang

et al. 2022

Preprint

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Regular patterns can form spontaneously in chemical reaction-diffusion systems under non-equilibrium conditions as proposed by Alan Turing. Here, we found that regular patterns can be generated in uphill-diffusion solution systems without a chemical reaction process through both in-situ and ex-situ observations. Organic semiconductor solution is confined between two parallel plates with controlled micron/submicron-meter distance, to minimize convection of the liquid and avoid spinodal precipitation at equilibrium. The solvent evaporation concentrates the solution gradually into an oversaturated non-equilibrium condition, under which a phase-transition occurs and ordered concentration-waves are generated. By proper tuning of the experimental parameter, multiple regular patterns with micro/nano-meter scaled features (line, square-grid, zig-zag, and fence-like patterns etc.) were observed. We explain the observed phenomenon as Turing-pattern generation resulted from uphill-diffusion and solution oversaturation. The generated patterns in the solutions can be condensed onto substrates to form structured micro/nanomaterials. We have fabricated organic semiconductor devices with such patterned materials to demonstrate the potential applications. Our observation may serve as a milestone in the progress towards a fundamental understanding of pattern formation in nature, like in biosystem, and pave a new avenue in developing self-assembling techniques of micro/nano structured materials.

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Section: Pattern Formation Mechanism and Simulationssupporting

confidence: 89%

Turing patterns with high-resolution formed without chemical reaction in thin-film solution of organic semiconductors

Xiang

et al. 2022

Preprint

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“…Li et al 108 demonstrated the pattern-formation process that can produce 2D arrays of sub-micrometric size through the principle that is similar to optical interference lithography, which is based on the interference between two beams, split from a coherent laser source, forms a standing wave that is recorded on a photoresist coated wafer to fabricate nanoscale pattern. 109,110 However, the solution based pattern-formation process using two waves are formed through the adjustment of the concentration in a dry solution next to the three-phase line or contact line.…”

Section: Self-assemble Direct Patternsmentioning

confidence: 99%

Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

2019

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“…Top-down techniques face problems in the fabrication of three dimensions (3D) and multi-material nanostructures, limiting the enhancement research 5 . While bottom-up techniques, such as selfassembly methods, show advantages over shape control and multi-composite synthesis, benefiting from the chemically synthesized nanoparticles [27][28][29][30][31][32][33] . Nevertheless, the nanostructures using bottom-up approaches usually feature random particle distribution.…”

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confidence: 99%

From macro to micro: multi-scale study of plasmonic nanocoating self-assembled on multijunction bulk solar cells

Su¹,

Zhang²,

Lv³

et al. 2020

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Nanophotonics pours into new opportunities to achieve ultrahigh-efficiency solar cells, attracting tremendous interests from photovoltaic research and industry. Plasmonic nanostructures, enabling strong light-matter interaction at the nanoscale, have been widely used for efficiency enhancement in thin-film solar cell devices based on plasmonic near-field effects. Unlike thin-film device cases, we found forward scattering and inter-particle coupling engineering of subwavelength plasmonic nanostructures are the key to enhance the efficiency of bulk multijunction solar cells (MJSCs). As a proof of concept, we studied the plasmonic enhancement of Ag@SiO2 nanocoating self-assembled on InGaP/GaInAs/Ge MJSCs at both macro and micro scales. From the macro measurements, the experimental enhancement of Ag@SiO2 core-shell nanostructure could be well-matched with the simulational results, where strong forward scattering and suppressed interparticle coupling could be simultaneously achieved by employing ~ 22 nm SiO2 shell layer. Using a double excitation method under an infinity optical microscope, we directly observed multi-wavelength uniform photocurrent enhancements on MJSCs at a submicrometer scale. This study will provide an effective strategy and opening up new opportunities to explore high-efficient MJSCs using nanophotonics.

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Two-dimensional arrays self-assembledviainterference of concentration modulation waves in drying solutions

Abstract: Self-assembly of patterned nanostructures in solution-processed thin films with single phase polymers is successful.

Cited by 3 publications

References 37 publications

Turing patterns with high-resolution formed without chemical reaction in thin-film solution of organic semiconductors

Turing patterns with high-resolution formed without chemical reaction in thin-film solution of organic semiconductors

Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

From macro to micro: multi-scale study of plasmonic nanocoating self-assembled on multijunction bulk solar cells

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