Two-component nanopillar arrays grown by Glancing Angle Deposition

Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles

“…In general, these microstructures are caused by the shadowing of the deposition flux when arriving at the growing film, which makes tall surface features prevent the deposition under their shadow. This produces a competitive growth among surface motives, which ends up in the development of tilted structures oriented towards the incoming deposition flux [6][7][8][9][10][11][12][13][14][15][16][17][18][19]. The use of these thin films as a host for the development of nanostructured composite materials is another potential application quite dependent on the final topology of the films that has been widely investigated by our group [20][21][22][23].…”

“…With this purpose we have deposited amorphous TiO2 thin films under different conditions and analyzed their microstructural features. This oxide has been employed as a test material due to its wide use in large number of applications [14][15][38][39], where a tight correlation between nanostructure and functional properties is determinant for its performance. On the other hand, we have developed a Monte Carlo (MC) model of the film growth that takes into account the short-range interaction between the film surface and the incoming deposition atoms, as well as the angular distribution of the deposition flux.…”

Embedding Ag Nanoparticles into MgF2 Nanorod Arrays

“…[24,[37][38][39][40][41] Both homogenous nanorod structures and heterogeneous multilayer nanorod structures have been successfully fabricated by the GLAD technique. [24,[37][38][39][40][41][42][43][44] We believe that the glancing angle co-deposition (GLACD) technique will be another versatile nanofabrication method capable of designing nanocomposite materials or doped nanostructures.…”

Growth of Y-Shaped Nanorods through Physical Vapor Deposition

“…To validate the proposed mechanism, we deposited Cu nanorods in an ultrahigh vacuum glancing angle magnetron sputter deposition system with a base pressure of 10 -9 Torr. To obtain the isolated Cu nanorods, we initially patterned Si(001) substrates using a monolayer of 500-nm-diameter polystyrene spheres that selfassemble from colloidal suspensions into a hexagonal closepacked array as described in detail in ref 16. Sputtering was then carried out in 2 mTorr 99.999% pure Ar using two 7.5-cm-diameter Cu targets (99.999% pure), mounted at an angle of 180°with respect to each other and with their surfaces being perpendicular to the substrate surface.…”

“…In our experiment, the average incident angle, θ, is controlled by the relative positions of the targets, the substrate and a collimating plate, and was chosen to be 84°, consistent with our molecular dynamics simulations, with a spread from 83 to 88°. 16 During deposition, the substrate was rotated continuously about the polar axis with a speed of 60 rpm so incident atoms arrive at the substrate from azimuthal angles. No external substrate heating was applied.…”