“…The tunneling process has already been studied using the silicon metal oxide semiconductor fieldeffect transistor (MOSFET). 13) Since, in that configuration, tunneling occurs in the direction perpendicular to the silicon oxide/silicon interface of the MOS structure, where carriers are two-dimensionally (2D) quantized, a very simple situation can be assumed. In the case of lateral tunneling between the 2D quantized electron inversion layer and the p + layer, however, the relationship between the Fermi potential controlled by the gate voltage and the p + (anode) voltage becomes complicated.…”