Abstract:Magnetic tunnel junctions (MTJ) with the tunnel barrier oxidized in two steps with plasma were fabricated to obtain a structurally uniform AlO x insulator. Plasma oxidation of 10 Å-thick Al layer for 5~20 sec formed the initial oxide barrier on top of which a second oxide layer was deposited by oxidizing 13 Å-thick Al for 120 sec. The doubly oxidized junctions exhibited a magnetoresistance (MR) ratio of 27~31 % depending on the oxidation period of the initial oxide layer while only 24 % was obtained for the ju… Show more
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