2014
DOI: 10.1002/adfm.201401493
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Tuning the Work Function of Polar Zinc Oxide Surfaces using Modified Phosphonic Acid Self‐Assembled Monolayers

Abstract: Zinc oxide (ZnO) is regarded as a promising alternative material for transparent conductive electrodes in optoelectronic devices. However, ZnO suffers from poor chemical stability. ZnO also has a moderate work function (WF), which results in substantial charge injection barriers into common (organic) semiconductors that constitute the active layer in a device. Controlling and tuning the ZnO WF is therefore necessary but challenging. Here, a variety of phosphonic acid based self‐assembled monolayers (SAMs) depo… Show more

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Cited by 174 publications
(224 citation statements)
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References 75 publications
(110 reference statements)
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“…Figure 1 shows the molecular structure of the aromatic PAs used for surface modification (Figure 1a−c), as well as the oligophenylene consisting of a three spiro-bridged ladder-type quarterphenyl (L4P-sp3, see Figure 1d), which was subsequently deposited as overlayer. (Pyrimidin-2-yl) methyl-phosphonic acid (PyPA, see Figure 1 a) was synthesized as described by Lange et al 14 and has a methylene group (alkyl spacer) between the PA anchoring group and the pyrimidine phenyl ring. Phenyl-phosphonic acid (PhPA, see Figure 1b) and p-(trifluoromethyl)phenyl-phosphonic acid (pCF 3 PhPA, see Figure 1c) were obtained from Aculon, Inc. and used as received.…”
Section: Methodsmentioning
confidence: 99%
“…Figure 1 shows the molecular structure of the aromatic PAs used for surface modification (Figure 1a−c), as well as the oligophenylene consisting of a three spiro-bridged ladder-type quarterphenyl (L4P-sp3, see Figure 1d), which was subsequently deposited as overlayer. (Pyrimidin-2-yl) methyl-phosphonic acid (PyPA, see Figure 1 a) was synthesized as described by Lange et al 14 and has a methylene group (alkyl spacer) between the PA anchoring group and the pyrimidine phenyl ring. Phenyl-phosphonic acid (PhPA, see Figure 1b) and p-(trifluoromethyl)phenyl-phosphonic acid (pCF 3 PhPA, see Figure 1c) were obtained from Aculon, Inc. and used as received.…”
Section: Methodsmentioning
confidence: 99%
“…5 Experiments on welldefined single crystalline ZnO (0001) and (000-1) surfaces proved that etching during immersion can be fully suppressed if dried ethanol (<0.01% H 2 O) is used as the solvent. A preparation protocol was developed which results in a very dense and homogenous molecular monolayer of oriented molecules on ZnO substrates.…”
mentioning
confidence: 98%
“…Following the protocol described in Ref. 5, SAMs from various BPAs and PyPA (see Figure 2(a)) were prepared on top of these ZnO substrates. We again find that the WF shift is largest for a specific optimum of immersion time, between 20 min and 2 h. Smaller WF shifts for nonoptimized immersion are supposedly due to an incomplete coverage for shorter times or stable multilayer formation at longer times.…”
mentioning
confidence: 99%
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“…Some effective approaches proposed so far include employing self-assembled monolayers, small molecules or high-molar-mass polymers such as poly(ethylene oxide) and poly(ethylene glycol), and nonconjugated polymers at the interfaces between the photoactive layers and ZnO. [22][23][24][25][26][27][28] Development of doped ZnO-based materials with a variety of different dopants, such as aluminum, indium, cesium, nitrogen, and hydrogen, has also been shown to improve the efficiency and stability of the fabricated cells. [29][30][31][32][33][34] On the other hand, atomic layer deposition (ALD) of dielectric oxides has been established as a viable and effective approach for the surface passivation of several metal oxides (including ZnO) in order to improve their optoelectronic properties; [35,36] it has also been implemented in silicon solar cell technology.…”
Section: Introductionmentioning
confidence: 99%