Tuning of Structural and Optical Properties of Graphene/ZnO Nanolaminates

Baitimirova, Margarita; Viter, Roman; Andzane, Jana; Lee, Arie van der; Voiry, Damien; Iatsunskyi, Igor; Coy, Emerson; Mikoliūnaitė, Lina; Tumėnas, Saulius; Załęski, Karol; Balevičius, Zigmas; Baleviciute, Ieva; Ramanavičienė, Almira; Ramanavičius, Arūnas; Jurga, Stefan; Erts, Donāts; Bechelany, Mikhael

doi:10.1021/acs.jpcc.6b07221

Cited by 77 publications

(58 citation statements)

References 57 publications

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“…[128] Atomic layer deposition (ALD) is gaining increasinga ttention in the energya nd environmental fields as ap romising methodf or surfacem odification and protection. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O.…”

Section: Atomic Layer Depositionmentioning

confidence: 99%

“…[129][130][131] ALD is a vapor deposition method of ultrathin layers. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O. [136] ALD is ad eposition technique that derives from the CVD technique;i ti sb ased on two self-limiting reactions absolutely separated in the gas phases.…”

Section: Atomic Layer Depositionmentioning

confidence: 99%

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Recent Progress on Titanium Dioxide Nanomaterials for Photocatalytic Applications

et al. 2018

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Environmental and energy problems have drawn much attention owing to rapid population growth and accelerated economic development. For instance, photocatalysis, "a green technology", plays an important role in solar-energy conversion owing to its potential to solve energy and environmental problems. Recently, many efforts have been devoted to improving visible-light photocatalytic activity by using titanium dioxide as a photocatalyst as a result of its wide range of applications in the energy and environment fields. However, fast charge recombination and an absorption edge in the UV range limit the photocatalytic efficiency of TiO under visible-light irradiation. Many investigations have been undertaken to overcome the limitations of TiO and, therefore, to enhance its photocatalytic activity under visible light. The present literature review focuses on different strategies used to promote the separation efficiency of electron-hole pairs and to shift the absorption edge of TiO to the visible region. Current synthesis techniques used to elaborate several nanostructures of TiO -based materials, recent progress in enhancing visible photocatalytic activity, and different photocatalysis applications will be discussed. On the basis of the studies reported in the literature, we believe that this review will help in the development of new strategies to improve the visible-light photocatalytic performance of TiO -based materials further.

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Section: Atomic Layer Depositionmentioning

confidence: 99%

Section: Atomic Layer Depositionmentioning

confidence: 99%

Recent Progress on Titanium Dioxide Nanomaterials for Photocatalytic Applications

et al. 2018

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“…If not specified otherwise, 500 cycles have been used to prepare the alumina films. Please note that the ALD process has first been studied on Si samples, where the thickness could easily be measured using spectroscopic ellipsometry (Semilab GES5E) (Baitimirova et al, 2016). Following the ALD, some of the samples were thermally treated at 1,150 • C at a heating rate of 5 • C/min with a dwell at this temperature for 1 or 10 h, depending on the samples.…”

Section: Methodsmentioning

confidence: 99%

Synthesis of Functional Ceramic Supports by Ice Templating and Atomic Layer Deposition

et al. 2018

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In this work, we report an innovative route for the manufacturing of functional ceramic supports, by combining ice templating of yttria stabilized zirconia (YSZ) and atomic layer deposition (ALD) of Al 2 O 3 processes. Ceramic YSZ monoliths are prepared using the ice-templating process, which is based on the controlled crystallization of water following a thermal gradient. Sublimation of the ice and the sintering of the material reveal the straight micrometer sized pores shaped by the ice crystal growth. The high temperature sintering allows for the ceramic materials to present excellent mechanical strength and porosities of 67%. Next, the conformality benefit of ALD is used to deposit an alumina coating at the surface of the YSZ pores, in order to obtain a functional material. The Al 2 O 3 thin films obtained by ALD are 100 nm thick and conformally deposited within the macroporous ceramic supports, as shown by SEM and EDS analysis. Mercury intrusion experiments revealed a reduction of the entrance pore diameter, in line with the growth per cycle of 2 Å of the ALD process. In addition to the manufacture of the innovative ceramic nanomaterials, this article also describes the fine characterization of the coatings obtained using mercury intrusion, SEM and XRD analysis.

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“…Several vapor phase methods are adopted for the deposition of ZnO thin films, such as sputtering [9], pulsed laser deposition [10], and atomic layer deposition (ALD). ALD, either thermal or enhanced by plasma (PE-ALD), has often been adopted as the method of choice to deliver high quality (ultra-)thin ZnO films [4,[11][12][13][14][15][16]. Polycrystalline thin films were obtained down to room temperature [4,17,18].…”

Section: Introductionmentioning

confidence: 99%

Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO

et al. 2020

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Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on c-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed ex-situ by a combination of spectroscopic ellipsometry and X-ray based techniques (diffraction, reflectivity, and fluorescence). Differently from the growth mode usually reported for thermal ALD ZnO (i.e., substrate-inhibited island growth), the effect of plasma surface activation resulted in a substrate-enhanced island growth. A transient region of accelerated island formation was found within the first 2 nm of deposition, resulting in the growth of amorphous ZnO as witnessed with grazing incidence X-ray diffraction. After the islands coalesced and a continuous layer formed, the first crystallites were found to grow, starting the layer-by-layer growth mode. High-temperature ALD ZnO layers were also investigated in terms of crystallization onset, showing that layers are amorphous up to a thickness of 3 nm, irrespective of the deposition temperature and growth orientation.

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Tuning of Structural and Optical Properties of Graphene/ZnO Nanolaminates

Cited by 77 publications

References 57 publications

Recent Progress on Titanium Dioxide Nanomaterials for Photocatalytic Applications

Recent Progress on Titanium Dioxide Nanomaterials for Photocatalytic Applications

Synthesis of Functional Ceramic Supports by Ice Templating and Atomic Layer Deposition

Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO

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