Tunable pinning effects produced by non‐uniform antidot arrays in YBCO thin films

George, Jonathan; Jones, Alison L; Al-Qurainy, Mustafa; Fedoseev, Sergey A.; Rosenfeld, Anatoly B.; Pan, Alexey V.

doi:10.1002/andp.201600283

Cited by 11 publications

(31 citation statements)

References 42 publications

(70 reference statements)

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“…In this work, we selected four representative patterns, which were also explored in our previous work, 11,12 for the proof of the concept purpose, rather than to optimize the expected J c enhancement. These four patterns were etched into different substrates as follows ( Fig.…”

Section: Methodsmentioning

confidence: 99%

“…A similar graded type of ring patterns with ADs of different dimensions has previously been successfully employed for pinning enhancement in different films. 11,26 T2 [ Fig. 1(c)] is the pattern with the largest etched region used having a 20 μm base and height.…”

Section: Methodsmentioning

confidence: 99%

“…This orientation is similar to the work done with ADs in an attempt to produce a ratchet effect, which allows flux to experience a stronger pinning effect entering (increasing field) than exiting (decreasing field). 11,12 C2 [ Fig. 1(d)] has the smallest features created having a 3 μm diameter and a period of 10 μm in a triangular array.…”

Section: Methodsmentioning

confidence: 99%

“…Recently, improvements to J c have also been found using "large" (2 μm-3 μm) ADs. [11][12][13][14] In this case, optical lithography may be used, which is technologically a much faster and cheaper process than EBL. The main concern with large ADs is that patterned films occasionally led to degradation.…”

Section: Introductionmentioning

confidence: 99%

“…The main concern with large ADs is that patterned films occasionally led to degradation. 11,12 Indeed, this process can be potentially damaging to the YBCO from ion implantation, handling, and water exposure. Moreover, even if J c is increased relative to plain (nonpatterned) films, the overall critical current (I c ) may still be reduced due to the removal of a relatively large volume of the superconductor.…”

Section: Introductionmentioning

confidence: 99%

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Enhancing the critical current of YBa2Cu3O7 thin films by substrate nanoengineering

Jones

Lam

et al. 2018

Journal of Applied Physics

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The critical current density, J c, can be increased by introducing defects throughout YBa 2Cu 3O 7 superconducting thin films. We propose a new approach of substrate nanoengineering to produce wellcontrolled defects. LaAlO 3 substrates have been ion-etched with different 34 nm deep patterns prior to the deposition of the films. An annealing step at 1000 °C after substrate etching has been undertaken to negate the Ar-ion damage to the surface. The J c of the so-prepared samples measured at different temperatures has been compared to thin films deposited on plain substrates at the same time. In general, an increase in J c is observed across all temperatures and fields as a result of both patterning and annealing. In particular, at zero field and 85 K, the largest enhancement of > 40% has been recorded for circle and triangle patterns. This new substrate nanoengineering technique is very promising for flux trapping of superconducting devices, particularly because an increase to critical current (I c) also occurs. Further optimization of depth, size, and shape of the patterns is expected to produce further improvements to J c.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%