2018
DOI: 10.1021/acs.chemmater.7b03460
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Tunable Charge Injection via Solution-Processed Reduced Graphene Oxide Electrode for Vertical Schottky Barrier Transistors

Abstract: We demonstrate, for the first time, the use of a solution-processed reduced graphene oxide (rGO) layer as a work function tunable electrode in vertical Schottky barrier (SB) transistors. The rGO electrodes were deposited by simple spray-coating onto the substrate. The vertical device structure was formed by sandwiching a N,N′-dioctyl-3,4,9,10-perylenedicarboximide (PTCDI-C8) organic semiconductor between rGO and Al electrodes. By varying the voltage applied to the gate electrode, the work function of rGO and t… Show more

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Cited by 34 publications
(30 citation statements)
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“…In such device cases, graphene, whose Fermi energy can be tuned by gate electric field, acts as an ideal source electrode to tune the Schottky barrier in VFETs . However, the performance of reported VFETs is still poor, especially for organic VFETs, e.g., demonstrating relatively low on/off ratio and current density . The main reasons are attributed to inferior charge transport in active semiconducting layer and/or the difficulties in suppressing off‐state current, which is induced by intrinsically insufficient Schottky barrier between graphene and organic semiconductors as well as the penetration influence of thermally evaporated metal atoms in vertical devices …”
mentioning
confidence: 99%
“…In such device cases, graphene, whose Fermi energy can be tuned by gate electric field, acts as an ideal source electrode to tune the Schottky barrier in VFETs . However, the performance of reported VFETs is still poor, especially for organic VFETs, e.g., demonstrating relatively low on/off ratio and current density . The main reasons are attributed to inferior charge transport in active semiconducting layer and/or the difficulties in suppressing off‐state current, which is induced by intrinsically insufficient Schottky barrier between graphene and organic semiconductors as well as the penetration influence of thermally evaporated metal atoms in vertical devices …”
mentioning
confidence: 99%
“…Depending on the governing charge transport/extraction mechanism, the slope of each graph along the 1/ V eff axis is determined to be either negative, positive, or a plateau (details in Figure S7, Supporting Information). [ 8 ] Apparently, the ternary MOSSFET architecture demonstrates a clear conversion of the slopes from negative to positive then a plateau, which signifies the transition of the governing mechanism from the field‐effect charge tunneling to field‐effect charge transport. This behavior is not observed in conventional n‐type MOSFETs (NMOS) where they exhibit invariance over the change of 1/ V eff .…”
Section: Resultsmentioning
confidence: 99%
“…Since the top layer does not constitute the channel region of the MOSSFET, the current flow through the top layer is governed mostly by the injection behaviors. When the energy‐level offsets are sufficiently large, the charge injection at the semiconductor–semiconductor interface obeys the Fowler–Nordheim model (field‐effect tunneling model) (Figure S7, Supporting Information) as follows: [ 8,11 ] Jt,inj Vd2expBdϕB1.5V …”
Section: Resultsmentioning
confidence: 99%
“…Vertical heterostructure devices are fabricated by a typical procedure in the following steps: preparation of 2D graphene on a gate dielectric, deposition of the organic semiconductor, and deposition of top electrodes. The vertical barristor is based on the principle that the current through vertical graphene/organic junctions can be finely controlled between “on” and “off” via modification of the gate‐tunable Schottky barrier height …”
Section: Electronic and Optoelectronic Applicationsmentioning
confidence: 99%