Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography

Yoo, Jae Beom; Park, Sang-Wook; Kang, Ha Na; Mondkar, Hemant S.; Sohn, Kyunghwa; Kim, Hyun-Mi; Kim, Ki-Bum; Lee, Haiwon

doi:10.1016/j.polymer.2014.06.008

Cited by 19 publications

(16 citation statements)

References 17 publications

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“…Our research began with the attempted synthesis of triphenyl sulfonium 4 (Scheme ). According to the reported procedures, we assumed that triflyloxy sulfonium I , generated in situ by treating diphenyl sulfoxide 1a with Tf 2 O, would interact with nucleophilic N,N -dimethylaniline, delivering 4 as the expected product. To our surprise, in lieu of triphenyl sulfonium 4 , α-arylated acetonitrile 5aa was isolated in 20% yield.…”

Section: Resultsmentioning

confidence: 99%

Redox-Neutral α-Arylation of Alkyl Nitriles with Aryl Sulfoxides: A Rapid Electrophilic Rearrangement

et al. 2017

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A facile α-arylation of nitriles has been developed by simply introducing TfO and DABCO to the mixture of nitriles and aryl sulfoxides. The transformation consists of two sequential steps: (i) TfO-initiated electrophilic assembly and and (ii) DABCO-triggered rearrangement. Each step can be tuned independently by changing the temperature and/or base. This adjustability allows the method to accommodate a wide range of substrates. Notable features of this new protocol include remarkable efficiency (20 min, -30 °C), exclusive regioselectivity, and high functional group compatibility, which can be challenging issues in traditional approaches. NMR studies not only identified a unique, highly unstable sulfonium imine complex but also demonstrated the importance of temperature in the formation and manipulation of this key intermediate. Further DFT calculations suggested that an electrophilic assembly, followed by removal of HOTf (by base), and finally [3,3]-sigmatropic rearrangement are three key stages in the reaction. The versatile transformability of the products and easy scalability of this reaction are also exhibited here.

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Section: Resultsmentioning

confidence: 99%

Redox-Neutral α-Arylation of Alkyl Nitriles with Aryl Sulfoxides: A Rapid Electrophilic Rearrangement

et al. 2017

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“…In this case too, the electrons in contact with the resist are modifying its solubility, permitting the selective removal of the exposed or non-exposed regions of the resist by subsequent etching in a solvent. The main advantage of this method relies on the maskless fabrication of sub-20 nm patterns in the horizontal plane [ 63 ] and of sub-10 nm patterns in the vertical plane [ 64 ] by employing a computer software that guides a finely focused beam of electrons over the patternable surface. Nonetheless, the best contrast and sensitivity of the material has to be considered when choosing the appropriate resist for high-aspect ratio patterns [ 65 ] and when aiming at sub-20 nm resolution on both positive and negative tones resists [ 66 ].…”

Section: Top–down Lithographic Methodologiesmentioning

confidence: 99%

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Handrea-Dragan

Botiz

2021

Polymers

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There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

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“…A comparison of these nanofabrication techniques is shown in Table 1. [11], and 58 nm/min [12] against different resists Slow 0.05 µm 3 /s in FIB deposition [13] Fast 15 wafers/h per imprint station [14] See Table 2 The biggest advantage of EBL and FIB is that they can pattern nanostructures with feature size in sub-5 nm and can process a wide range of materials, such as metals [8], alloys [15], hard and brittle ceramics and semiconductors [13], and polymers [16], making them extremely suitable techniques to process nanostructures with high precision [17]. However, the processing environment is harsh and requires vacuum operation.…”

Section: Introductionmentioning

confidence: 99%

“…The processing speed of EBL is dependent on the type of electron beam resist. For example, the patterning speed of EBL can achieve 17 nm/min [10], 40 nm/min [11], and 58 nm/min [12] against SML resist, poly (GMA-co-MMA-co-TPSMA) resist, and IM-MFP 12-8 resist, respectively. Furthermore, FIB can be destructive and modify the electrical properties of the substrate surface via undesirable deposition of gallium ions.…”

Section: Introductionmentioning

confidence: 99%

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

et al. 2022

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High-throughput and high-accuracy nanofabrication methods are required for the ever-increasing demand for nanoelectronics, high-density data storage devices, nanophotonics, quantum computing, molecular circuitry, and scaffolds in bioengineering used for cell proliferation applications. The scanning probe lithography (SPL) nanofabrication technique is a critical nanofabrication method with great potential to evolve into a disruptive atomic-scale fabrication technology to meet these demands. Through this timely review, we aspire to provide an overview of the SPL fabrication mechanism and the state-the-art research in this area, and detail the applications and characteristics of this technique, including the effects of thermal aspects and chemical aspects, and the influence of electric and magnetic fields in governing the mechanics of the functionalized tip interacting with the substrate during SPL. Alongside this, the review also sheds light on comparing various fabrication capabilities, throughput, and attainable resolution. Finally, the paper alludes to the fact that a majority of the reported literature suggests that SPL has yet to achieve its full commercial potential and is currently largely a laboratory-based nanofabrication technique used for prototyping of nanostructures and nanodevices.

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Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography

Cited by 19 publications

References 17 publications

Redox-Neutral α-Arylation of Alkyl Nitriles with Aryl Sulfoxides: A Rapid Electrophilic Rearrangement

Redox-Neutral α-Arylation of Alkyl Nitriles with Aryl Sulfoxides: A Rapid Electrophilic Rearrangement

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

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