“…Among the developed radical trifluoromethylation methods, photoredox‐ or transition‐metal‐catalyzed radical trifluoromethylation has received great attention recently. In this context, a large number of trifluoromethylation reagents have been recognized as the trifluoromethyl radical precursors, including CF 3 X (X=I, Br), CF 3 CO 2 H and its derivatives, CF 3 SO 2 ‐containing compounds (CF 3 SO 2 Na, Zn(SO 2 CF 3 ) 2 , [CF 3 SO 2 Ag], CF 3 SO 2 Cl, triflones), TMSCF 3 , Umemoto reagent, and Togni reagent . However, most of them are either expensive (Zn(SO 2 CF 3 ) 2 , Umemoto and Togni reagents), commercially unavailable ([CF 3 SO 2 Ag], triflones), gaseous (CF 3 I, CF 3 Br), or volatile (CF 3 SO 2 Cl, TMSCF 3 ), which significantly restricts their widespread application.…”